SCHEMBL119648

SCHEMBL119648

C=CCOC(=O)NCCC[C@H](NC(=O)OCC1c2ccccc2-c2ccccc21)C(=O)O

nearest known ligand 0.55

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 1/20 0.55
▸ MDM2 Q00987 5/20 0.50
▸ TLR2 O60603 2/20 0.49
▸ MDM4 O15151 1/20 0.48
▸ TP53 P04637 1/20 0.48
▸ CASP3 P42574 2/20 0.46
▸ CASP1 P29466 2/20 0.46
▸ TGM2 P21980 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29400312 1.00 KMT2A (0.55) KMT2AMDM2TLR2MDM4TP53
SCHEMBL119653 1.00 KMT2A (0.55) KMT2AMDM2TLR2MDM4TP53
SCHEMBL12898821 1.00 KMT2A (0.55) KMT2AMDM2TLR2MDM4TP53
SCHEMBL29400732 1.00 KMT2A (0.55) KMT2AMDM2TLR2MDM4TP53
SCHEMBL178688 1.00 KMT2A (0.55) KMT2AMDM2TLR2MDM4TP53
SCHEMBL25358347 0.97 KMT2A (0.57) KMT2AMDM2TLR2MDM4TP53
SCHEMBL21462054 0.97 KMT2A (0.57) KMT2AMDM2TLR2MDM4TP53
SCHEMBL29401249 0.97 KMT2A (0.57) KMT2AMDM2TLR2MDM4TP53
SCHEMBL178771 0.97 KMT2A (0.57) KMT2AMDM2TLR2MDM4TP53
SCHEMBL29350360 0.97 KMT2A (0.57) KMT2AMDM2TLR2MDM4TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 — — US disclosed
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 — — US disclosed
US-8841136-B2 Levetiracetam immunoassays ARK DIAGNOSTICS, INC. (US) 2014-09-23 — — US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 — — US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 — — US disclosed
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