Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.52 |
| ▸ | BIRC2 | Q13490 | 1/20 | 0.41 |
| ▸ | MME | P08473 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.32 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.32 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.32 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.32 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12914922 | 1.00 | CA1 (0.52) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL9609800 | 1.00 | CA1 (0.52) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL19428729 | 1.00 | CA1 (0.52) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL14942765 | 0.89 | CA2 (0.61) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL4845983 | 0.87 | CA2 (0.64) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL17616867 | 0.86 | CA2 (0.50) | CA1CA2BIRC2MMEKMT2A | |
| SCHEMBL14434900 | 0.86 | CA1 (0.46) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL14407715 | 0.86 | SLC1A1 (0.48) | CA1CA2BIRC2MMESMN1; SMN2 | |
| SCHEMBL19248924 | 0.85 | CA2 (0.46) | CA1CA2BIRC2MMEKMT2A | |
| SCHEMBL13924641 | 0.84 | CA1 (0.44) | CA1CA2BIRC2SMN1; SMN2USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247159-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-21 | — | — | US | disclosed |