Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1888569 | 0.76 | — | — | |
| SCHEMBL1887613 | 0.76 | TSHR (0.47) | ALDH1A1 | |
| Fluoride SCHEMBL29105260 | 0.74 | — | — | |
| SCHEMBL252158 | 0.73 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL28573456 | 0.72 | DPP4 (0.52) | DPP4ALDH1A1 | |
| SCHEMBL5412610 | 0.70 | TSHR (0.43) | DPP4ALDH1A1 | |
| SCHEMBL9862232 | 0.69 | DPP4 (0.36) | DPP4ALDH1A1 | |
| SCHEMBL27896224 | 0.69 | DPP4 (0.42) | DPP4ALDH1A1 | |
| SCHEMBL6887964 | 0.69 | — | — | |
| SCHEMBL17316227 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 710 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3474952-B1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM & HAAS (US) | 2021-07-28 | — | — | EP | claimed |
| US-20190133913-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM & HAAS (US) | 2019-05-09 | — | — | US | claimed |
| EP-3474952-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | Rohm and Haas Company (US) | 2019-05-01 | — | — | EP | claimed |
| WO-2017222570-A1 | COMPOSITIONS CONTAINING LATEX PARTICLES AND UV ABSORBERS | ROHM AND HAAS COMPANY (US) | 2017-12-28 | — | — | WO | claimed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | claimed |
| US-20030091926-A1 | Glass transition temperature above room temperature; tack free | SHIPLEY COMPANY, L.L.C. | 2003-05-15 | — | — | US | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| EP-1098223-A1 | Dry film photopolymerizable compositions | Shipley Company LLC (US) | 2001-05-09 | — | — | EP | claimed |
| US-20230265311-A1 | Cure-on-Demand Coatings | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2023-08-24 | — | — | US | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-109983595-B | Composition for organic electronic device encapsulant and encapsulant formed using the same | 莫门蒂夫性能材料韩国株式会社 | 2023-04-04 | — | — | CN | disclosed |
| EP-3522241-B1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2023-03-22 | — | — | EP | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| US-4195997-A | COLD FLOW RESISTANCE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1980-04-01 | — | — | US | disclosed |
| US-4177074-A | HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-12-04 | — | — | US | disclosed |
| US-4127436-A | PHOTORESIST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-11-28 | — | — | US | disclosed |
| US-4054483-A | Additives process for producing plated holes in printed circuit elements | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-4054479-A | Additive process for producing printed circuit elements using a self-supported photosensitive sheet | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-3984244-A | Process for laminating a channeled photosensitive layer on an irregular surface | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-10-05 | — | — | US | disclosed |