SCHEMBL12014338

SCHEMBL12014338

OCCCCCCCCCCCCCN1CCOCC1

nearest known ligand 0.61

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.61
ALDH1A1 P00352 1/20 0.61
SMN1; SMN2 Q16637 2/20 0.56
KEAP1 Q14145 1/20 0.56
HPGD P15428 1/20 0.50
DUSP3 P51452 1/20 0.50
GLA P06280 1/20 0.45
PAOX Q6QHF9 1/20 0.45
GAA P10253 1/20 0.44
POLB P06746 1/20 0.44
SIGMAR1 Q99720 1/20 0.44
KDM1A O60341 1/20 0.44
LMNA P02545 2/20 0.43
HTR7 P34969 2/20 0.43
HRH3 Q9Y5N1 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12014341 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL1404044 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL12014345 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL12014335 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL12014339 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL1403881 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL1404061 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL1403807 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL12014344 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD
SCHEMBL1404065 1.00 KDM4E (0.61) KDM4EALDH1A1SMN1; SMN2KEAP1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8568956-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-29 US disclosed
US-8530135-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-8530135-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed