Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.56 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.50 |
| ▸ | GLA | P06280 | 1/20 | 0.45 |
| ▸ | PAOX | Q6QHF9 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | KDM1A | O60341 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | HTR7 | P34969 | 2/20 | 0.43 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12014335 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL1404061 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL1403807 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL1404044 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL12014341 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL12014340 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL1404065 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL12014345 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL12014342 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD | |
| SCHEMBL1403881 | 1.00 | KDM4E (0.61) | KDM4EALDH1A1SMN1; SMN2KEAP1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8530135-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530135-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |