SCHEMBL12014374

SCHEMBL12014374

O=C(CCN1CCCCC1)OCCO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.52
MAPT P10636 4/20 0.52
POLB P06746 1/20 0.52
L3MBTL1 Q9Y468 2/20 0.50
CYP1A2 P05177 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
MAPK1 P28482 1/20 0.44
TSHR P16473 2/20 0.43
THRB P10828 4/20 0.42
LMNA P02545 2/20 0.42
HRH3 Q9Y5N1 2/20 0.42
CHRM2 P08172 1/20 0.42
CHRM4 P08173 1/20 0.42
CHRM5 P08912 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
ADRA2C P18825 1/20 0.42
DRD4 P21917 1/20 0.42
ACHE P22303 1/20 0.42
SLC6A2 P23975 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65246 0.98 ALDH1A1 (0.48) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL30917891 0.90 SMN1; SMN2 (0.39) ALDH1A1MAPTPOLBL3MBTL1SMN1; SMN2
SCHEMBL18154851 0.90 SMN1; SMN2 (0.39) ALDH1A1MAPTPOLBL3MBTL1SMN1; SMN2
SCHEMBL13463362 0.90 ALDH1A1 (0.46) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL12014421 0.82 ALDH1A1 (0.48) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL13490180 0.82 ALDH1A1 (0.41) ALDH1A1POLBL3MBTL1SMN1; SMN2LMNA
SCHEMBL12014373 0.82 GLA (0.53) ALDH1A1MAPTPOLBSMN1; SMN2TSHR
SCHEMBL11461137 0.81 ALDH1A1 (0.55) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL31259111 0.81 ALDH1A1 (0.59) ALDH1A1MAPTPOLBL3MBTL1CYP1A2
SCHEMBL12014422 0.81 ALDH1A1 (0.59) ALDH1A1MAPTPOLBL3MBTL1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8568956-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-29 US disclosed
US-8568956-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-10-29 US disclosed
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed