SCHEMBL12039596

SCHEMBL12039596

CC(C)(C)C(=O)NS(=O)(=O)CC12CCC(CC1=O)C2(C)C

nearest known ligand 0.69

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.69
CYP1A2 P05177 1/20 0.57
CYP2C19 P33261 1/20 0.57
KMT2A Q03164 2/20 0.55
F2 P00734 2/20 0.54
PRSS1 P07477 2/20 0.54
PRSS2 P07478 2/20 0.54
PRSS3 P35030 2/20 0.54
CA1 P00915 7/20 0.53
CA2 P00918 7/20 0.53
CA5A P35218 7/20 0.53
CA5B Q9Y2D0 7/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
KDM4E B2RXH2 1/20 0.52
MEN1 O00255 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26452675 0.90 ALDH1A1 (0.66) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL24146541 0.90 ALDH1A1 (0.65) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL108451 0.89 ALDH1A1 (0.65) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL26452909 0.88 ALDH1A1 (0.63) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL13966716 0.86 ALDH1A1 (0.61) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL24028210 0.86 ALDH1A1 (0.60) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL24146497 0.86 ALDH1A1 (0.66) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL18698667 0.85 ALDH1A1 (0.60) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL21396828 0.85 ALDH1A1 (0.59) ALDH1A1CYP1A2CYP2C19KMT2AF2
SCHEMBL27792104 0.85 ALDH1A1 (0.64) ALDH1A1CYP1A2CYP2C19KMT2AF2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795944-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-08-05 US disclosed
US-20110318687-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed