Ethylenediamine

Ethylenediamine

SCHEMBL1204153

NCCN.OCCO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D

The experimentally established mechanism targets of Ethylenediamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107073678-B Polishing layer imporosity formed body, polishing pad and polishing method 株式会社可乐丽 2019-11-19 CN disclosed
CN-110225933-A Aqueous polyurethane resin combination 株式会社艾迪科 2019-09-10 CN disclosed
EP-2688953-B1 PHOSPHOROUS-CONTAINING FLAME RETARDANTS FOR POLYURETHANE FOAMS DOW GLOBAL TECHNOLOGIES LLC (US) 2019-05-01 EP disclosed
CN-108409960-A A method of preserving materials synthesis polyurethane using carbon dioxide 内蒙古工业大学 2018-08-17 CN disclosed
CN-107429561-A Handle the fracturing fluid and method of hydrocarbon containing formation 通用电气(GE)贝克休斯有限责任公司 2017-12-01 CN disclosed
CN-107073678-A Non-porous molded body for polishing layer, polishing pad, and polishing method 株式会社可乐丽 2017-08-18 CN disclosed
CN-107001818-A Black pigments comprising graphenic carbon particles PPG工业俄亥俄公司 2017-08-01 CN disclosed
CN-104387559-B Acoustical absorption heat preserving spraying combined polyether of half perforate and preparation method thereof 山东诺威新材料有限公司 2017-06-09 CN disclosed
CN-106660805-A Graphenic carbon particle co-dispersions and methods of making same PPG工业俄亥俄公司 2017-05-10 CN disclosed
EP-1457836-B2 Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate FUJIFILM CORP (JP) 2016-08-17 EP disclosed
EP-1457837-A2 Developing solution for heat-sensitive lithographic printing plate precursor and method for peparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2004-09-15 EP disclosed
US-20040063036-A1 Method of making lithographic printing plate FUJI PHOTO FILM CO., LTD. 2004-04-01 US disclosed
EP-1400856-A2 Method of making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2004-03-24 EP disclosed
US-20040053168-A1 Exposing the heat-sensitive plate to light, and developing with an alkaline solution comprising sulfactants and salts; improve image contrast, resist to scratch, dispersing the development sludge FUJI PHOTO FILM CO., LTD. 2004-03-18 US disclosed
EP-1398151-A2 Method of making lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2004-03-17 EP disclosed
CN-1074746-C Prepn. process of hydrazine hydrate MITSUBISHI GAS CHEMICAL CO (JP) 2001-11-14 CN disclosed
CN-1148027-A Prepn. process of hydrazine hydrate MITSUBISHI GAS CHEMICAL CO (JP) 1997-04-23 CN disclosed
EP-0671460-A1 ELECTROVISCOUS FLUID Tonen Corporation (JP) 1995-09-13 EP disclosed
US-4847184-A SCANNING, CARBONIZATION OF SUBSTRATE SURFACES KANZAKI PAPER MANUFACTURING CO., LTD. (JP) 1989-07-11 US disclosed
US-4066578-A CONDENSATION POLYMERIZATION, CROSSLINKING W. R. GRACE & CO. (US) 1978-01-03 US disclosed