Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 1/20 | 0.73 |
| ▸ | DGKA | P23743 | 1/20 | 0.70 |
| ▸ | PAM | P19021 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.50 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.50 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | NAAA | Q02083 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | HTR2C | P28335 | 1/20 | 0.47 |
| ▸ | MGLL | Q99685 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9716983 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401273 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL12120239 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401271 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401272 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL12120241 | 0.98 | DNM1 (0.77) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401268 | 0.96 | DNM1 (0.74) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401266 | 0.96 | DNM1 (0.74) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401264 | 0.96 | DNM1 (0.74) | DNM1DGKAPAMTSHRMAPT | |
| SCHEMBL17401265 | 0.96 | DNM1 (0.74) | DNM1DGKAPAMTSHRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8057981-B2 | Resist composition, resist protective coating composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-8057981-B2 | Resist composition, resist protective coating composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-7759047-B2 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7759047-B2 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090208867-A1 | Resist Composition, Resist Protective Coating Composition, and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208867-A1 | Resist Composition, Resist Protective Coating Composition, and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20080085466-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20080085466-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |