SCHEMBL12120243

SCHEMBL12120243

O=C(OCCN(CCOC(=O)C1CCCC1)CCOC(=O)C1CCCC1)C1CCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.41
▸ CYP3A4 P08684 4/20 0.41
▸ TSHR P16473 3/20 0.41
▸ CHRM2 P08172 3/20 0.41
▸ CHRM1 P11229 3/20 0.41
▸ LMNA P02545 2/20 0.41
▸ CYP1A2 P05177 2/20 0.41
▸ CYP2D6 P10635 2/20 0.41
▸ DRD1 P21728 2/20 0.41
▸ DRD3 P35462 2/20 0.41
▸ KCNH2 Q12809 2/20 0.41
▸ CHRM4 P08173 2/20 0.41
▸ CHRM3 P20309 2/20 0.41
▸ ABCB11 O95342 1/20 0.41
▸ CHRM5 P08912 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ HRH2 P25021 1/20 0.41
▸ HTR2A P28223 1/20 0.41
▸ HTR2C P28335 1/20 0.41
▸ HRH1 P35367 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12120245 0.98 ALDH1A1 (0.44) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL845395 0.89 MAPT (0.36) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL27189598 0.87 CHRM2 (0.56) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL24177954 0.87 ALDH1A1 (0.40) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL24177938 0.87 ALDH1A1 (0.43) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL20077544 0.84 EPHX2 (0.39) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL22414196 0.84 EPHX2 (0.39) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL22097541 0.84 ALDH1A1 (0.35) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL9480431 0.82 ALDH1A1 (0.49) ALDH1A1CYP3A4TSHRCHRM2CHRM1
SCHEMBL9480955 0.82 ALDH1A1 (0.49) ALDH1A1CYP3A4TSHRCHRM2CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 — — US disclosed
US-12036025-B2 Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-16 — — US disclosed
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 — — US disclosed
US-20240215891-A1 Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 — — US disclosed
US-20240215890-A1 Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 — — US disclosed
US-20240215890-A1 Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-04 — — US disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 — — US disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 — — US disclosed
US-11783958-B2 Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-11783958-B2 Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-7759047-B2 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-20 — — US disclosed
US-7759047-B2 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-20 — — US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 — — US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 — — US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 — — US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 — — US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 — — US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 — — US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 — — US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 — — US disclosed
Send feedback