SCHEMBL12124124

SCHEMBL12124124

C=CC(=O)OCCC(=C)C(=O)OC1(CC)CC2CC1C1CCCC21

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
HPGD P15428 1/20 0.32
ALDH1A1 P00352 1/20 0.31
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4403854 0.83 ALDH1A1 (0.33) ALDH1A1
SCHEMBL4399258 0.82
SCHEMBL2117636 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL14523975 0.78 ALDH1A1 (0.30) ALDH1A1
SCHEMBL12190117 0.75
SCHEMBL75351 0.74 TSHR (0.30) TSHR
SCHEMBL9609343 0.73 ALDH1A1 (0.33) ALDH1A1
SCHEMBL4400989 0.73 TSHR (0.31) TSHRALDH1A1
SCHEMBL9608674 0.73 ALDH1A1 (0.31) ALDH1A1
SCHEMBL19954391 0.73 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8057983-B2 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-15 US disclosed
US-20090269695-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-10-29 US disclosed