Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 12/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | PKM | P14618 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25689244 | 0.91 | KDM4E (0.36) | KDM4EALDH1A1PKMMAPTMAPK1 | |
| SCHEMBL22883585 | 0.91 | KDM4E (0.36) | KDM4EALDH1A1PKMMAPTMAPK1 | |
| SCHEMBL32688573 | 0.88 | KDM4E (0.38) | KDM4EALDH1A1PKMMAPTMAPK1 | |
| SCHEMBL24183481 | 0.85 | KDM4E (0.36) | KDM4EALDH1A1PKMMAPTMAPK1 | |
| SCHEMBL24142269 | 0.84 | KDM4E (0.33) | KDM4EALDH1A1PKMPOLBALOX15 | |
| SCHEMBL12922446 | 0.82 | KDM4E (0.33) | KDM4EALDH1A1PKMPOLBALOX15 | |
| SCHEMBL12922447 | 0.82 | KDM4E (0.33) | KDM4EALDH1A1PKMPOLBALOX15 | |
| SCHEMBL10332359 | 0.81 | KDM4E (0.37) | KDM4EALDH1A1PKMMAPTMAPK1 | |
| SCHEMBL2606007 | 0.81 | KDM4E (0.37) | KDM4EALDH1A1PKMPOLBALOX15 | |
| SCHEMBL12460487 | 0.81 | KDM4E (0.31) | KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8329838-B2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | PROMERUS LLC (US) | 2012-12-11 | — | — | US | disclosed |
| US-8062830-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20110189618-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110183264-A1 | RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110171586-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110091820-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110065878-A1 | Norbornene-Type Polymers, Compositions Thereof And Lithographic Processes Using Such Compositions | PROMERUS LLC (US) | 2011-03-17 | — | — | US | disclosed |