SCHEMBL12128705

SCHEMBL12128705

CC(F)(F)C(=O)OCCOc1ccc2ccccc2c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 5/20 0.55
PPARA Q07869 4/20 0.55
PPARD Q03181 3/20 0.55
KDM4E B2RXH2 3/20 0.53
TDP1 Q9NUW8 2/20 0.53
MAPK1 P28482 1/20 0.53
ALDH1A1 P00352 2/20 0.51
PTPN7 P35236 1/20 0.49
HDAC1 Q13547 1/20 0.47
RAB9A P51151 3/20 0.47
NPC1 O15118 2/20 0.47
MAPT P10636 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
CPT2 P23786 1/20 0.46
CPT1A P50416 1/20 0.46
CPT1B Q92523 1/20 0.46
GAA P10253 1/20 0.45
XBP1 P17861 1/20 0.45
MEN1 O00255 1/20 0.44
HTT P42858 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14087714 0.86 PPARA (0.55) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL12787493 0.84 PPARG (0.54) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL12128713 0.84 PPARG (0.41) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL12128702 0.83 CYP1A2 (0.47) PPARGPPARAPPARDHDAC1
SCHEMBL2605918 0.82 PPARG (0.49) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL17011408 0.82 KDM4E (0.60) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL14087709 0.82 KDM4E (0.60) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL14009406 0.81 PPARG (0.48) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL9880794 0.81 KDM4E (0.59) PPARGPPARAPPARDKDM4ETDP1
SCHEMBL14035923 0.81 PPARG (0.48) PPARGPPARAPPARDKDM4ETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8062830-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-22 US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 US disclosed
US-20110183264-A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-28 US disclosed
US-20110171586-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20110091820-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed