SCHEMBL14035923

SCHEMBL14035923

O=C(OCCOc1ccc2ccccc2c1)C(F)(F)OOS

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 4/20 0.48
PPARD Q03181 3/20 0.48
PPARA Q07869 3/20 0.48
KDM4E B2RXH2 3/20 0.48
TDP1 Q9NUW8 2/20 0.48
MAPK1 P28482 1/20 0.48
PTPN7 P35236 1/20 0.44
ALDH1A1 P00352 2/20 0.44
HDAC1 Q13547 1/20 0.43
RAB9A P51151 4/20 0.43
NPC1 O15118 3/20 0.43
MAPT P10636 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
CPT2 P23786 1/20 0.43
CPT1A P50416 1/20 0.43
CPT1B Q92523 1/20 0.43
GAA P10253 1/20 0.42
XBP1 P17861 1/20 0.42
MEN1 O00255 1/20 0.41
HTT P42858 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035730 0.86 PPARG (0.36) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL14035687 0.85 CYP1A2 (0.43) PPARGPPARDPPARAHDAC1
SCHEMBL12128705 0.81 PPARG (0.55) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL14035685 0.81 KMT2A (0.47) KDM4ETDP1PTPN7ALDH1A1NPC1
SCHEMBL14035690 0.79 SLC1A3 (0.41) TDP1HDAC1RAB9ANPC1MAPT
SCHEMBL13842649 0.79 PPARG (0.47) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL14035918 0.79 KDM4E (0.46) KDM4ETDP1ALDH1A1MCL1HPGD
SCHEMBL2605918 0.78 PPARG (0.49) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL14009406 0.77 PPARG (0.48) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13842641 0.76 PPARG (0.47) PPARGPPARDPPARAKDM4ETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed