SCHEMBL12130484

SCHEMBL12130484

CCC(C)C(=O)OCCN

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GABRR1 P24046 2/20 0.38
CYP1A2 P05177 1/20 0.34
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.34
THRB P10828 1/20 0.34
CNR1 P21554 1/20 0.34
ALOX15 P16050 1/20 0.32
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA4 P43681 1/20 0.31
GABBR2 O75899 1/20 0.31
GABBR1 Q9UBS5 1/20 0.31
CPB2 Q96IY4 1/20 0.31
CTH P32929 1/20 0.31
IDO1 P14902 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26152774 1.00 GABRR1 (0.38) GABRR1CYP1A2ALDH1A1MAPTTHRB
SCHEMBL10049498 0.87 CYP1A2 (0.41) GABRR1CYP1A2ALDH1A1CPB2
SCHEMBL13667079 0.85 ALDH1A1 (0.37) ALDH1A1THRBALOX15
SCHEMBL22926643 0.84 GABRR1 (0.39) GABRR1CYP1A2ALDH1A1MAPTTHRB
SCHEMBL12391494 0.82
SCHEMBL17617139 0.81 HCAR2 (0.40) ALDH1A1
SCHEMBL805664 0.81 HCAR2 (0.40) ALDH1A1
SCHEMBL25738448 0.81
SCHEMBL805650 0.81 HCAR2 (0.40) ALDH1A1
SCHEMBL27266937 0.81 TSHR (0.36) GABRR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11773266-B2 Polymer, molded body, foam, resin composition, and production method for polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-03 US disclosed
US-20230129965-A1 HYDROPHILIC AND OLEOPHOBIC POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-04-27 US disclosed
WO-2019181840-A1 AQUEOUS INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD 富士フイルム株式会社 2019-09-26 WO disclosed
US-20180030175-A1 POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-02-01 US disclosed
US-20170008991-A1 GRAFT POLYMER AND METHOD FOR PRODUCING SAME NITTO BOSEKI CO., LTD. (JP) 2017-01-12 US disclosed
US-20160367979-A1 METHOD FOR SEPARATING AND CONCENTRATING TARGET SUBSTANCE USING NOVEL CATIONIC GRAFT POLYMER NITTO BOSEKI CO., LTD. (JP) 2016-12-22 US disclosed
US-9035292-B2 Organic thin-film transistor insulating layer material SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-05-19 US disclosed
US-8803187-B2 Protection of light emitting devices EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-08-12 US disclosed
US-20140070205-A1 ORGANIC THIN-FILM TRANSISTOR INSULATING LAYER MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-03-13 US disclosed
US-20120292626-A1 OPTICAL AND THERMAL ENERGY CROSS-LINKABLE INSULATING LAYER MATERIAL FOR ORGANIC THIN FILM TRANSISTOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-22 US disclosed
US-8063162-B2 Polymer for an ink receiving layer of an inkjet recording element HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-11-22 US disclosed
US-20110160416-A1 POLYMER FOR AN INK RECEIVING LAYER OF AN INKJET RECORDING ELEMENT CHEN TIENTEH 2011-06-30 US disclosed
US-7923117-B2 first monomer of the polymer includes at least one amine functional group; aminoethylmethacrylate; aminoethylacrylate; second monomer includes a carbon backbone having at least one silane functional group pendant; prevent dye from migrating HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-04-12 US disclosed
US-20080182936-A1 POLYMER FOR AN INK RECEIVING LAYER OF AN INKJET RECORDING ELEMENT HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2008-07-31 US disclosed