SCHEMBL12153643

SCHEMBL12153643

C=CC(=O)OCC(=O)OC12CC3(C)CC(O)(CC(OCC)(C3)C1)C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12153634 0.93 TSHR (0.33) HPGDTSHR
SCHEMBL12153632 0.93 TSHR (0.33) HPGDTSHR
SCHEMBL685716 0.90 TSHR (0.33) HPGDTSHR
SCHEMBL685092 0.90 TSHR (0.33) HPGDTSHR
SCHEMBL12153594 0.87
SCHEMBL12153644 0.83 THRB (0.33)
SCHEMBL12153659 0.83 TSHR (0.37) HPGDTSHR
SCHEMBL685099 0.82 TSHR (0.36) HPGDTSHR
SCHEMBL21249342 0.81
SCHEMBL12153631 0.80 HPGD (0.30) HPGDTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8048612-B2 Polymer and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-01 US disclosed
US-20090317744-A1 POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-12-24 US disclosed