Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14294716 | 0.88 | SCN9A (0.39) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL10225066 | 0.86 | SCN9A (0.35) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL13467028 | 0.85 | SCN9A (0.43) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL12157324 | 0.84 | SCN9A (0.35) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL13848264 | 0.83 | SCN9A (0.43) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL17409270 | 0.83 | DPP8 (0.31) | — | |
| SCHEMBL1635598 | 0.82 | SCN9A (0.34) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL14294661 | 0.82 | ALDH1A1 (0.37) | SCN9AALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL12040120 | 0.81 | SCN9A (0.33) | SCN9A | |
| SCHEMBL686263 | 0.81 | SCN9A (0.33) | SCN9AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9182670-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20140329183-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-06 | — | — | US | disclosed |
| US-8815491-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8288076-B2 | Chemically amplified resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8048610-B2 | Sulfonium salt-containing polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20100304302-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |