⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14571320 | 0.83 | — | — | |
| SCHEMBL2759295 | 0.78 | MEN1 (0.31) | — | |
| SCHEMBL9612223 | 0.78 | KDM4E (0.31) | — | |
| SCHEMBL15095428 | 0.78 | MEN1 (0.31) | — | |
| SCHEMBL20208292 | 0.78 | MEN1 (0.31) | — | |
| SCHEMBL21555677 | 0.78 | — | — | |
| SCHEMBL12655538 | 0.77 | — | — | |
| SCHEMBL19450695 | 0.72 | — | — | |
| SCHEMBL15764751 | 0.72 | — | — | |
| SCHEMBL16421242 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230303472-A1 | MOLECULAR TETRAHEDRON NANOCAGE, ITS PREPARATION, AND USES THEREOF | PURDUE RESEARCH FOUNDATION | 2023-09-28 | — | — | US | disclosed |
| US-20170253013-A1 | THERMOSETTING RESIN COMPOSITION AND PREPREG AND LAMINATED BOARD PREPARED THEREFROM | SHENGYI TECHNOLOGY CO., LTD. (CN) | 2017-09-07 | — | — | US | disclosed |
| WO-2017048719-A1 | MALEIC ANHYDRIDE POLYMERS AND METHODS OF TREATING SUBTERRANEAN FORMATIONS | SAUDI ARABIAN OIL COMPANY (SA) | 2017-03-23 | — | — | WO | disclosed |
| US-20130017488-A1 | Self-Imageable Layer Forming Polymer and Compositions Thereof | PROMERUS LLC (US) | 2013-01-17 | — | — | US | disclosed |
| EP-2375285-A2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM Corporation (JP) | 2011-10-12 | — | — | EP | disclosed |
| EP-1811339-A1 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |