Methacrylic Acid

Methacrylic Acid

SCHEMBL1220641

C=C(C)C(=O)O.CC1CCc2ccccc21

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PIN1 Q13526 2/20 0.44
HTR2A P28223 1/20 0.42
HTR2C P28335 1/20 0.42
HTR2B P41595 1/20 0.42
HTT P42858 1/20 0.42
PDPK1 O15530 1/20 0.41
TAS1R3 Q7RTX0 1/20 0.41
TAS1R1 Q7RTX1 1/20 0.41
TAS1R2 Q8TE23 1/20 0.41
NOTUM Q6P988 1/20 0.41
MTNR1A P48039 3/20 0.40
MTNR1B P49286 3/20 0.40
TSHR P16473 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
CYP11B2 P19099 1/20 0.39
RXRA P19793 3/20 0.39
LMNA P02545 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL186363 0.82 HTR2A (0.57) HTR2AHTR2CHTR2BPDPK1CYP11B2
SCHEMBL15147096 0.82 HTR2A (0.57) HTR2AHTR2CHTR2BPDPK1CYP11B2
SCHEMBL8160821 0.77 PIN1 (0.58) PIN1HTTPDPK1TSHRNPSR1
SCHEMBL7681059 0.77 PIN1 (0.54) PIN1HTTPDPK1TAS1R3TAS1R1
Methacrylic Acid SCHEMBL19876936 0.77 HSD17B3 (0.48) NOTUMMTNR1AMTNR1BTSHRLMNA
Methacrylic Acid SCHEMBL30106824 0.77 HSD17B3 (0.48) NOTUMMTNR1AMTNR1BTSHRLMNA
Hydrogen Peroxide SCHEMBL8418801 0.75 IDO1 (0.50) HTR2AHTR2CHTR2BHTTPDPK1
SCHEMBL8848989 0.74 PIN1 (0.58) PIN1PDPK1TAS1R3TAS1R1TAS1R2
SCHEMBL4742598 0.74 PIN1 (0.58) PIN1PDPK1TAS1R3TAS1R1TAS1R2
Methacrylic Acid SCHEMBL8982198 0.73 TSHR (0.48) HTTNOTUMMTNR1AMTNR1BTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7887988-B2 Acid generator; irradiating with actinic radiation FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
EP-1835341-B1 Positive resist composition and pattern forming method using the same FUJIFILM CORP (JP) 2009-06-24 EP disclosed
US-20070218407-A1 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-20 US disclosed
EP-1835341-A1 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2007-09-19 EP disclosed