⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4817900 | 0.92 | NAAA (0.32) | — | |
| SCHEMBL12284779 | 0.90 | NAAA (0.34) | — | |
| SCHEMBL14648992 | 0.89 | NAAA (0.35) | — | |
| SCHEMBL12284804 | 0.89 | — | — | |
| SCHEMBL12284478 | 0.88 | — | — | |
| SCHEMBL12284798 | 0.87 | — | — | |
| SCHEMBL14648973 | 0.86 | TSHR (0.30) | — | |
| SCHEMBL12287511 | 0.85 | NAAA (0.33) | — | |
| SCHEMBL12284800 | 0.84 | NAAA (0.31) | — | |
| SCHEMBL12285391 | 0.84 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150316847-A1 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST | OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| US-20150316847-A1 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST | OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| US-20130022914-A1 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST | IDEMITSU KOSAN CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022914-A1 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST | IDEMITSU KOSAN CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| WO-2011125291-A1 | HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST | 出光興産株式会社 (JP) | 2011-10-13 | — | — | WO | disclosed |