SCHEMBL12293167

SCHEMBL12293167

CC(=O)Nc1ccc(/C(=N/OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 5/20 0.42
MAPK1 P28482 1/20 0.42
HDAC1 Q13547 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
HDAC6 Q9UBN7 1/20 0.37
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA9 Q16790 2/20 0.36
HPGD P15428 1/20 0.36
RECQL P46063 1/20 0.36
ALDH1A1 P00352 5/20 0.36
HTT P42858 1/20 0.36
LMNA P02545 1/20 0.36
IDO1 P14902 1/20 0.36
CA12 O43570 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
F2 P00734 1/20 0.36
PRSS1 P07477 1/20 0.36
PRSS2 P07478 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2763517 0.77 CA1 (0.40) CA1CA2CA9CA12L3MBTL1
SCHEMBL12293173 0.76 CYP1A2 (0.40) SMN1; SMN2CA1CA2CA9HPGD
SCHEMBL10083963 0.75 CA1 (0.32) CA1CA2L3MBTL1
SCHEMBL12238426 0.75 CA1 (0.37) CA1CA2CA9ALDH1A1CA12
SCHEMBL12238602 0.72 CA1 (0.35) CA1CA2F2PRSS1PRSS2
SCHEMBL14044388 0.71 CA1 (0.37) SMN1; SMN2CA1CA2ALDH1A1HTT
SCHEMBL13935863 0.71 PIK3CD (0.34) SMN1; SMN2HDAC1HDAC7HDAC8HDAC6
SCHEMBL178330 0.69 SRD5A2 (0.42) SMN1; SMN2CA1CA2CA9HPGD
SCHEMBL12352790 0.69 SRD5A2 (0.42) SMN1; SMN2CA1CA2CA9HPGD
SCHEMBL12551386 0.68 SMN1; SMN2 (0.40) SMN1; SMN2MAPK1CA1CA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011132764-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2011-10-27 WO disclosed