SCHEMBL1229548

SCHEMBL1229548

CCC(C(C)=O)C(=O)[O-].CCCC[O-].CCCC[O-].CCCC[O-].[Zr+4]

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.41
CA1 P00915 3/20 0.38
CES1 P23141 5/20 0.34
CYP3A4 P08684 2/20 0.34
TSHR P16473 2/20 0.34
NFKB1 P19838 2/20 0.34
NPSR1 Q6W5P4 2/20 0.34
CES2 O00748 4/20 0.33
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL449993 1.00 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL1230029 1.00 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL829930 0.96 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL1681963 0.96 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL261344 0.96 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL6681534 0.96 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL1229453 0.96 CA2 (0.41) CA2CA1CES1CYP3A4TSHR
SCHEMBL418150 0.92 CA2 (0.36) CA2CA1TSHR
SCHEMBL4450986 0.86 CA2 (0.41) CA2CES1CES2MAPK1
SCHEMBL17550733 0.86 CA2 (0.41) CA2CES1CES2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250196117-A1 INORGANIC NANOSHEET COMPOSITE AND METHOD FOR PRODUCING INORGANIC NANOSHEET COMPOSITE FUKUOKA INSTITUTE OF TECHNOLOGY (JP) 2025-06-19 US disclosed
US-20240101442-A1 INORGANIC NANOSHEET LAMINATED STRUCTURE, INORGANIC NANOSHEET LIQUID CRYSTAL COMPOSITION, METHOD FOR PRODUCING INORGANIC NANOSHEET LAMINATED STRUCTURE, AND METHOD FOR PRODUCING INORGANIC NANOSHEET LIQUID CRYSTAL COMPOSITION FUKUOKA INSTITUTE OF TECHNOLOGY (JP) 2024-03-28 US disclosed
CN-116685461-A Laminate and medical device 富士胶片株式会社 2023-09-01 CN disclosed
EP-4209459-A1 INORGANIC-NANOSHEET MULTILAYER STRUCTURE, INORGANIC-NANOSHEET LIQUID-CRYSTAL COMPOSITION, METHOD FOR PRODUCING INORGANIC-NANOSHEET MULTILAYER STRUCTURE, AND METHOD FOR PRODUCING INORGANIC-NANOSHEET LIQUID-CRYSTAL COMPOSITION Fukuoka Institute Of Technology (JP) 2023-07-12 EP disclosed
CN-113316560-A Surface-treated infrared-absorbing fine particles, surface-treated infrared-absorbing fine particle powder, infrared-absorbing fine particle dispersion liquid using the surface-treated infrared-absorbing fine particles, infrared-absorbing fine particle dispersion, and infrared-absorbing base material 住友金属矿山株式会社 2021-08-27 CN disclosed
CN-112074582-A Surface-treated infrared-absorbing fine particle dispersion and infrared-absorbing transparent substrate 住友金属矿山株式会社 2020-12-11 CN disclosed
EP-1746134-B1 CURABLE COMPOSITION WITH IMPROVED CURABILITY AND ADHESIVENESS KANEKA CORP (JP) 2019-09-04 EP disclosed
EP-1746135-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2019-05-29 EP disclosed
US-9808771-B2 Membranes FUJIFILM MANUFACTURING EUROPE B.V. (NL) 2017-11-07 US disclosed
US-9586183-B2 Membranes FUJIFILM MANUFACTURING EUROPE BV (NL) 2017-03-07 US disclosed
WO-2004056837-A1 PROCESS FOR THE PRODUCTION OF HYDROCARBYL SILYL CARBOXYLATE COMPOUNDS SIGMA COATINGS B.V. (NL) 2004-07-08 WO disclosed
WO-2004056838-A1 PROCESS FOR THE PRODUCTION OF SILYL CARBOXYLATE MONOMERS SIGMA COATINGS B.V. (NL) 2004-07-08 WO disclosed
EP-1431301-A1 Process for the production of silyl carboxylate monomers SIGMA COATINGS B.V. (NL) 2004-06-23 EP disclosed
WO-2003093350-A1 ORGANO-FUNCTIONAL POLYSILOXANES SIGMAKALON SERVICES B.V. (NL) 2003-11-13 WO disclosed
EP-1361245-A1 Amino-functional polysiloxanes SigmaKalon Group B.V. (NL) 2003-11-12 EP disclosed
EP-1359182-A1 Organo-functional polysiloxanes SigmaKalon Group B.V. (NL) 2003-11-05 EP disclosed
US-6262289-B1 HEATING IN PRESENCE OF METAL ALKOXIDE KANEKA CORPORATION (JP) 2001-07-17 US disclosed
EP-0990660-A1 PROCESS FOR PREPARING CYCLIC OLIGOSILOXANES Kaneka Corporation (JP) 2000-04-05 EP disclosed
US-5391797-A Reacting alkoxysilane with polysiloxane in presence of aluminum alkoxide, zirconium alkoxide or zirconium chelate catalyst KANEGAFUCHI CHEMICAL INDUSTRY CO., LTD. (JP) 1995-02-21 US disclosed
EP-0618211-A1 Process for preparing alkoxysilane Kanegafuchi Chemical Industry Co., Ltd. (JP) 1994-10-05 EP disclosed