SCHEMBL122960

SCHEMBL122960

[CH2]C(=C)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL821275 0.79
SCHEMBL27363111 0.76
SCHEMBL2404212 0.76
SCHEMBL8210066 0.74
SCHEMBL8220523 0.74 CES2 (0.50)
SCHEMBL8220221 0.74 CES2 (0.50)
SCHEMBL8216674 0.74 CES2 (0.50)
SCHEMBL8218505 0.74 CES2 (0.50)
SCHEMBL3419364 0.72
SCHEMBL73471 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1612 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0683174-B1 Thioether containing photopolymerizable compositions EASTMAN KODAK CO (US) 1998-08-05 EP claimed
US-5532286-A BONDING STRENGTH EASTMAN KODAK COMPANY (US) 1996-07-02 US claimed
US-5518789-A ACRYLIC ESTER OR AMIDE, OPTICAL RECORDING EASTMAN KODAK COMPANY (US) 1996-05-21 US claimed
EP-0683174-A2 Thioether containing photopolymerizable compositions EASTMAN KODAK COMPANY (US) 1995-11-22 EP claimed
EP-0009302-B1 CLAVULANIC ACID DERIVATIVES AND PROCESS FOR THEIR PREPARATION BEECHAM GROUP PLC (GB) 1983-10-26 EP claimed
EP-0009302-A1 Clavulanic acid derivatives and process for their preparation BEECHAM GROUP PLC (GB) 1980-04-02 EP claimed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
CN-118295212-A Composition for forming resist underlayer film containing glycol structure 日产化学株式会社 2024-07-05 CN disclosed
US-20240218293-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-12025916-B2 Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added NISSAN CHEMICAL CORPORATION (JP) 2024-07-02 US disclosed
CN-113348165-B 1,2, 4-Triazin-3 (2H) -one compounds for the treatment of hyperproliferative diseases 拜耳股份有限公司 2024-06-25 CN disclosed
CN-114423739-B Improved enantioselective hydrogenation of 4-substituted 1, 2-dihydroquinolines in the presence of chiral iridium catalysts and additives 拜耳公司 2024-06-25 CN disclosed
US-4297267-A Hexavalent chromium internal colorants for diol bis (allyl carbonate) polymerizates PPG INDUSTRIES, INC. (US) 1981-10-27 US disclosed
US-4293503-A Synthesis of polyol bis(allyl carbonate) utilizing reagent recovery and recycle PPG INDUSTRIES, INC. (US) 1981-10-06 US disclosed
US-4273726-A FROM BIS(CHLOROFORMATE) AND AN ALLYL ALCOHOL PPG INDUSTRIES, INC. (US) 1981-06-16 US disclosed
US-4273702-A Cobalt aluminate internal colorants for diol bis (allyl carbonate) PPG INDUSTRIES, INC. (US) 1981-06-16 US disclosed
US-4181626-A BIS(ALLYL CARBONATE) PPG INDUSTRIES, INC. (US) 1980-01-01 US disclosed
US-4091019-A OXYGEN-FREE, PALLADIUM OR PLATINUM-PHOSPHORUS LIGAND CATALYST MONSANTO COMPANY (US) 1978-05-23 US disclosed
US-4069168-A AS PHOTOCHROMIC AGENT AND INFRARED ABSORBER; MONOMER OR POLYMER OF ALLYL GLYCOL CARBONATES PPG INDUSTRIES, INC. (US) 1978-01-17 US disclosed