Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12334396 | 0.87 | NPSR1 (0.44) | NPSR1L3MBTL1ALDH1A1TP53LMNA | |
| SCHEMBL14770348 | 0.80 | NPSR1 (0.37) | NPSR1ALDH1A1 | |
| SCHEMBL14770314 | 0.80 | NPSR1 (0.37) | NPSR1ALDH1A1 | |
| SCHEMBL14760577 | 0.79 | NPSR1 (0.36) | NPSR1 | |
| SCHEMBL25568859 | 0.75 | NPSR1 (0.43) | NPSR1L3MBTL1ALDH1A1TP53LMNA | |
| SCHEMBL5442806 | 0.74 | NPSR1 (0.49) | NPSR1L3MBTL1ALDH1A1LMNAMEN1 | |
| SCHEMBL14760530 | 0.72 | ALDH1A1 (0.34) | NPSR1L3MBTL1ALDH1A1TP53LMNA | |
| SCHEMBL12705428 | 0.71 | NPSR1 (0.43) | NPSR1L3MBTL1ALDH1A1TP53LMNA | |
| SCHEMBL24268511 | 0.71 | NPSR1 (0.40) | NPSR1ALDH1A1 | |
| SCHEMBL135702 | 0.71 | ALDH1A1 (0.53) | NPSR1ALDH1A1LMNAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2011115138-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN FORMATION METHOD | JSR株式会社 (JP) | 2011-09-22 | — | — | WO | disclosed |