SCHEMBL1233784

SCHEMBL1233784

C=CC(=O)OCCCCCCN(C(C)(C)C)C(C)(C)C

nearest known ligand 0.63

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.63
ALDH1A1 P00352 4/20 0.63
CYP3A4 P08684 2/20 0.63
HPGD P15428 1/20 0.53
TP53 P04637 3/20 0.44
HIF1A Q16665 3/20 0.44
HSD17B10 Q99714 1/20 0.44
THRB P10828 2/20 0.41
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HCAR2 Q8TDS4 3/20 0.37
ATM Q13315 1/20 0.35
ZDHHC20 Q5W0Z9 1/20 0.31
NAAA Q02083 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.30
ABCB1 P08183 1/20 0.30
ABCC1 P33527 1/20 0.30
ABCG2 Q9UNQ0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL500266 0.86 TSHR (0.50) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL10955287 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL108310 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL11785615 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL499541 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL499748 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL499274 0.81 TSHR (0.70) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL8493780 0.80 TSHR (1.00) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL9101988 0.80 TSHR (1.00) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL322713 0.80 TSHR (1.00) TSHRALDH1A1CYP3A4HPGDTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6372866-B1 None US disclosed
US-8789937-B2 Ink jet recording method and liquid dispersant RICOH COMPANY, LTD. (JP) 2014-07-29 US disclosed
US-8752947-B2 Ink jet recording method and liquid dispersant RICOH COMPANY, LTD. (JP) 2014-06-17 US disclosed
US-20120133702-A1 INK JET RECORDING METHOD AND LIQUID DISPERSANT RICOH COMPANY, LTD. (JP) 2012-05-31 US disclosed
US-20120133703-A1 INK JET RECORDING METHOD AND LIQUID DISPERSANT RICOH COMPANY, LTD. (JP) 2012-05-31 US disclosed
US-7993592-B2 Process for production of amphoteric electrolyte resin by continuous bulk polymerization and apparatus for the production TAISEI CHEMICAL INDUSTRIES, LTD. (JP) 2011-08-09 US disclosed
US-20110158856-A1 PROCESS FOR PRODUCTION OF AMPHOTERIC ELECTROLYTE RESIN BY CONTINUOUS BULK POLYMERIZATION AND APPARATUS FOR THE PRODUCTION TAISEI HOLDINGS CO., LTD. (JP) 2011-06-30 US disclosed
US-7879957-B2 Process for production of amphoteric electrolyte resin by continuous bulk polymerization and apparatus for the production TAISEI CHEMICAL INDUSTRIES, LTD. (JP) 2011-02-01 US disclosed
US-20090131610-A1 Process for Production of Amphoteric Electrolyte Resin by Continuous Bulk Polymerization and Apparatus for the Production TAISEI CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-21 US disclosed
EP-1285774-B1 Ink-jet recording paper KONISHIROKU PHOTO IND (JP) 2006-04-05 EP disclosed
US-6838135-B2 Ink-jet recording paper KONICA CORPORATION (JP) 2005-01-04 US disclosed
US-20030104177-A1 Ink-jet recording paper KONICA CORPORATION (JP) 2003-06-05 US disclosed
EP-0972783-B1 Method for producing amphoteric resin having dispersing function TAISEI CHEMICAL IND LTD (JP) 2003-05-28 EP disclosed
EP-1285774-A2 Ink-jet recording paper KONICA CORPORATION (JP) 2003-02-26 EP disclosed
US-6372866-B2 USING AS EMULSIFIER A WATER-SOLUBLE POLYMER OBTAINED BY SUBJECTING A POLYMER HAVING MOLECULAR WEIGHT OF 5,000 TO 100,000 OBTAINED BY COPOLYMERIZING AN AMINO GROUP-CONTAINING COMPOUND WITH A COMPOUND COPOLYMERIZABLE THEREWITH; PAINTS TAISEI CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-16 US disclosed
US-20020007008-A1 PROCESS FOR PRODUCING CATIONIC EMULSION TAISEI HOLDINGS CO., LTD. (JP) 2002-01-17 US disclosed
US-6174963-B1 CATALYTIC ADDITION POLYMERIZATION OF MONOMERS WITH EPOXY GROUPS TAISEI CHEMICAL INDUSTRIES, LTD. (JP) 2001-01-16 US disclosed
EP-0972783-A1 Method for producing amphoteric resin having dispersing function Taisei Chemical Industries Ltd (JP) 2000-01-19 EP disclosed
US-4659781-A Reactive acrylic oligomer, grafted acrylic resinous composition based on said oligomer and coating composition containing the same NIPPON PAINT CO., LTD. (JP) 1987-04-21 US disclosed
US-4177179-A ACRYLIC COPOLYMER AND EPOXY COMPOUND TOYO SODA MANUFACTURING CO., LTD. (JP) 1979-12-04 US disclosed