⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12345982 | 0.92 | CYP17A1 (0.31) | — | |
| SCHEMBL12345992 | 0.88 | CYP17A1 (0.35) | — | |
| SCHEMBL12345984 | 0.85 | — | — | |
| SCHEMBL12345972 | 0.81 | CYP17A1 (0.39) | — | |
| SCHEMBL12345993 | 0.80 | — | — | |
| SCHEMBL12345987 | 0.79 | — | — | |
| SCHEMBL12345991 | 0.79 | — | — | |
| SCHEMBL12345988 | 0.78 | — | — | |
| SCHEMBL12345976 | 0.77 | CYP17A1 (0.31) | — | |
| SCHEMBL12345971 | 0.75 | CYP17A1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8476473-B2 | Compound, method for preparing the compound and resist composition containing the compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8476473-B2 | Compound, method for preparing the compound and resist composition containing the compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20110189618-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110189618-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20100055609-A1 | COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20100055609-A1 | COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-04 | — | — | US | disclosed |