SCHEMBL12345992

SCHEMBL12345992

CC1C2CC3CC(C2)C(C)(OC(=O)C(F)(F)C(F)(F)C(=O)OC2(C)C4CC5CC(C4)C(C)C2C5)C1C3

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.35
CYP19A1 P11511 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12345982 0.91 CYP17A1 (0.31) CYP17A1CYP19A1
SCHEMBL12345985 0.88
SCHEMBL26014274 0.82 CYP17A1 (0.31) CYP17A1CYP19A1
SCHEMBL12345984 0.81
SCHEMBL12345978 0.80 CYP17A1 (0.48) CYP17A1CYP19A1
SCHEMBL22643370 0.75 CYP19A1 (0.38) CYP17A1CYP19A1
SCHEMBL12346010 0.72 CYP19A1 (0.42) CYP17A1CYP19A1
SCHEMBL12345987 0.72
SCHEMBL12345971 0.71 CYP17A1 (0.41) CYP17A1CYP19A1
SCHEMBL18903144 0.71 CYP17A1 (0.33) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8476473-B2 Compound, method for preparing the compound and resist composition containing the compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-8476473-B2 Compound, method for preparing the compound and resist composition containing the compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 US disclosed
US-20100055609-A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed
US-20100055609-A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100055609-A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND AFF1, H4C1; H4C2; H4C3; H4C4; H4C5; H4C6; H4C8; H4C9; H4C11; H4C12; H4C13; H4C14; H4C15; H4C16, AFF4 CYP17A1 246/4885CYP19A1 30/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.