SCHEMBL12360767

SCHEMBL12360767

Cc1cc(Br)c(C)[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12602035 0.77
SCHEMBL12602050 0.77
SCHEMBL20844184 0.72
SCHEMBL13249225 0.70 PDE3B (0.41)
SCHEMBL20412726 0.69 GAA (0.38)
SCHEMBL33270 0.69
SCHEMBL2907131 0.69 GRIN2D (0.41)
SCHEMBL22319885 0.67
SCHEMBL10111172 0.67 LMNA (0.32)
SCHEMBL3123895 0.66 GRIN2D (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019059161-A1 PYRIDONE COMPOUND AND AGRICULTURAL AND HORTICULTURAL GERMICIDE HAVING SAME AS ACTIVE INGREDIENT 三井化学アグロ株式会社 2019-03-28 WO disclosed
US-8541488-B2 Formed resin article and polymer film FUJIFILM CORPORATION (JP) 2013-09-24 US disclosed
US-20110186791-A1 ULTRAVIOLET ABSORBENT COMPOSITION FUJIFILM CORPORATION (JP) 2011-08-04 US disclosed
US-20110092619-A1 FORMED RESIN ARTICLE AND POLYMER FILM FUJIFILM CORPORATION (JP) 2011-04-21 US disclosed
US-7897761-B2 Heterocyclic compound FUJIFILM CORPORATION (JP) 2011-03-01 US disclosed
US-7897761-B2 Heterocyclic compound FUJIFILM CORPORATION (JP) 2011-03-01 US disclosed
US-20110024701-A1 Ultraviolet Absorbent Composition FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
EP-2272935-A1 ULTRAVIOLET ABSORBENT COMPOSITIONS FUJIFILM Corporation (JP) 2011-01-12 EP disclosed
EP-2270076-A1 RESIN MOLDED PRODUCT AND POLYMER FILM FUJIFILM Corporation (JP) 2011-01-05 EP disclosed
US-20100004439-A1 Heterocyclic Compound FUJIFLM CORPORATION (JP) 2010-01-07 US disclosed
US-20100004439-A1 Heterocyclic Compound FUJIFLM CORPORATION (JP) 2010-01-07 US disclosed