⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13265533 | 0.89 | — | — | |
| SCHEMBL12959745 | 0.82 | — | — | |
| SCHEMBL6899229 | 0.75 | — | — | |
| SCHEMBL35306 | 0.75 | — | — | |
| SCHEMBL101748 | 0.69 | — | — | |
| SCHEMBL102092 | 0.69 | — | — | |
| SCHEMBL15082703 | 0.69 | — | — | |
| SCHEMBL3938140 | 0.69 | — | — | |
| SCHEMBL5855725 | 0.67 | ALDH1A1 (0.32) | — | |
| SCHEMBL12374766 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9433626-B2 | Pyrido[4,3-B]indole and pyrido[3,4-B]indole derivatives and methods of use | MEDIVATION TECHNOLOGIES, INC. (US) | 2016-09-06 | — | — | US | disclosed |
| US-20150335654-A1 | PYRIDO [4,3-B] INDOLE AND PYRIDO [3,4-B] INDOLE DERIVATIVES AND METHODS OF USE | MEDIVATION TECHNOLOGIES, INC. | 2015-11-26 | — | — | US | disclosed |
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-7989478-B2 | decreases expression of a Type I collage gene in a tissue to induce a reduction in accumulation of collagen and thereby improves tissue fibrosis | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-02 | — | — | US | disclosed |
| US-7989478-B2 | decreases expression of a Type I collage gene in a tissue to induce a reduction in accumulation of collagen and thereby improves tissue fibrosis | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-02 | — | — | US | disclosed |
| US-7691883-B2 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-04-06 | — | — | US | disclosed |
| US-7691883-B2 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-04-06 | — | — | US | disclosed |
| US-20100081652-A1 | Cinnamoyl Compound and Use Thereof | SHIRAKI HIROAKI | 2010-04-01 | — | — | US | disclosed |
| US-20100081652-A1 | Cinnamoyl Compound and Use Thereof | SHIRAKI HIROAKI | 2010-04-01 | — | — | US | disclosed |
| US-20090143368-A1 | Use of Cinnamoyl Compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090143368-A1 | Use of Cinnamoyl Compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-1857455-A1 | CINNAMOYL COMPOUND AND USE THEREOF | Sumitomo Chemical Company, Limited (JP) | 2007-11-21 | — | — | EP | disclosed |
| EP-1857104-A1 | USE OF CINNAMOYL COMPOUND | Sumitomo Chemical Company, Limited (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |