SCHEMBL12376741

SCHEMBL12376741

C=C(C)C(=O)OC12CC3CC(C1)CC(C(=O)OCCC)(C3)C2

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.47
ALDH1A1 P00352 2/20 0.35
RXFP1 Q9HBX9 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
TSHR P16473 3/20 0.33
LMNA P02545 3/20 0.33
ABL1 P00519 1/20 0.32
RIN1 Q13671 1/20 0.32
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18021927 0.86 NPSR1 (0.42) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL12409643 0.86 NPSR1 (0.43) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL20668206 0.86 NPSR1 (0.46) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL15726700 0.85 NPSR1 (0.41) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL13963902 0.84 NPSR1 (0.40) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL12376743 0.84 NPSR1 (0.42) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL20668454 0.84 NPSR1 (0.42) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL20668205 0.84 NPSR1 (0.42) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL20668491 0.83 NPSR1 (0.41) NPSR1ALDH1A1RXFP1L3MBTL1MEN1
SCHEMBL16018734 0.83 NPSR1 (0.41) NPSR1ALDH1A1RXFP1L3MBTL1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X NPSR1 1114/4885ALDH1A1 4540/4885RXFP1 1013/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.