SCHEMBL12376767

SCHEMBL12376767

C=Cc1ccc2cc(S(=O)(=O)O)ccc2c1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.66
SNCA P37840 2/20 0.47
ALDH1A1 P00352 7/20 0.46
HSD17B10 Q99714 5/20 0.46
CASP6 P55212 3/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
NT5E P21589 3/20 0.40
LMNA P02545 3/20 0.38
NSD2 O96028 2/20 0.37
MCL1 Q07820 1/20 0.37
DUSP3 P51452 1/20 0.37
PTPN5 P54829 1/20 0.37
PTPN11 Q06124 1/20 0.37
TSHR P16473 3/20 0.36
NPC1 O15118 1/20 0.36
TP53 P04637 1/20 0.36
MAPT P10636 1/20 0.36
XBP1 P17861 1/20 0.36
MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30233294 0.82 SNCA (0.62) TDP1SNCAALDH1A1HSD17B10CASP6
SCHEMBL305423 0.82 SNCA (0.62) TDP1SNCAALDH1A1HSD17B10CASP6
SCHEMBL300937 0.82 SNCA (0.62) TDP1SNCAALDH1A1HSD17B10CASP6
SCHEMBL25711 0.80 TDP1 (1.00) TDP1ALDH1A1HSD17B10NT5ELMNA
SCHEMBL452529 0.80 TDP1 (1.00) TDP1ALDH1A1HSD17B10NT5ELMNA
SCHEMBL31126649 0.80 TDP1 (1.00) TDP1ALDH1A1HSD17B10NT5ELMNA
SCHEMBL836622 0.80 SNCA (0.60) TDP1SNCAALDH1A1HSD17B10CASP6
Hydrochloric Acid SCHEMBL9252711 0.80 SNCA (0.60) TDP1SNCAALDH1A1HSD17B10CASP6
SCHEMBL1416021 0.80 SNCA (0.60) TDP1SNCAALDH1A1HSD17B10CASP6
SCHEMBL3101290 0.80 SNCA (0.60) TDP1SNCAALDH1A1HSD17B10CASP6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230132653-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X TDP1 3710/4885SNCA 2962/4885ALDH1A1 4540/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.