SCHEMBL12376796

SCHEMBL12376796

CC(F)(F)COC(=O)c1ccc2c(c1)CCCC2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
NPC1 O15118 5/20 0.43
RAB9A P51151 5/20 0.43
HTT P42858 3/20 0.43
MAPT P10636 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
HPGD P15428 1/20 0.43
TRPV1 Q8NER1 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
SERPINE1 P05121 1/20 0.41
CTNNB1 P35222 1/20 0.41
WNT3A P56704 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.40
RXRB P28702 2/20 0.40
RXRA P19793 1/20 0.40
RXRG P48443 1/20 0.40
HDAC6 Q9UBN7 2/20 0.40
ALOX15 P16050 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12409479 0.82 ALDH1A1 (0.42) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL457941 0.80 CA12 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL17013373 0.80 ALDH1A1 (0.55) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL12376794 0.80 ALDH1A1 (0.45) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL12376778 0.78 ALDH1A1 (0.54) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL31359527 0.77 ALDH1A1 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL16329478 0.77 ALDH1A1 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL12376834 0.76 KMT2A (0.51) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL2633409 0.75 ALDH1A1 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL31544703 0.75 ALDH1A1 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X ALDH1A1 4540/4885MEN1 4079/4885KMT2A 1677/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.