Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | ACR | P10323 | 3/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.31 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12376821 | 0.90 | ELANE (0.39) | ELANEKMT2AATMMAPTCA12 | |
| SCHEMBL12119756 | 0.88 | ELANE (0.46) | ELANEKMT2AATMMAPTALDH1A1 | |
| SCHEMBL11991257 | 0.82 | CA1 (0.47) | ELANEKMT2AMAPTALDH1A1CA1 | |
| SCHEMBL26059442 | 0.80 | TRPV1 (0.36) | ELANEKMT2AATMMAPTALDH1A1 | |
| SCHEMBL18776001 | 0.80 | CYP4F2 (0.37) | KMT2AMAPTCA12CA1CA2 | |
| SCHEMBL22694210 | 0.79 | CA12 (0.56) | KMT2AALDH1A1CA12CA1CA2 | |
| SCHEMBL13178127 | 0.79 | MAPT (0.41) | KMT2AMAPTALDH1A1CA12CA1 | |
| SCHEMBL18775760 | 0.79 | ELANE (0.44) | ELANEKMT2AATMMAPTALDH1A1 | |
| SCHEMBL15216265 | 0.79 | ELANE (0.43) | ELANEKMT2AMAPTALDH1A1CA12 | |
| SCHEMBL12119787 | 0.78 | ELANE (0.39) | ELANEKMT2AATMMAPTCA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9657115-B2 | Polymer compound for a conductive polymer and method for manufacturing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-20170115565-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9587137-B2 | Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate | SHI-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-07 | — | — | US | disclosed |
| US-9493597-B2 | Polymer compound having a specific super strongly acidic sulfo group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20160231652-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-9360753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-20150340118-A1 | CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-26 | — | — | US | disclosed |
| US-20150175722-A1 | POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR MANUFACTURING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-25 | — | — | US | disclosed |
| US-20150175730-A1 | POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-25 | — | — | US | disclosed |
| US-8691490-B2 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-08 | — | — | US | disclosed |
| US-20130029270-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | RPS4Y1, ETV6, RPS4X | ELANE 288/4885KMT2A 1677/4885ATM 3727/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.