SCHEMBL15216265

SCHEMBL15216265

CCC(C)(C)C(=O)Oc1ccc(C(=O)OC(C)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 14/20 0.43
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
PRTN3 P24158 3/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPT P10636 1/20 0.34
TSHR P16473 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15216272 0.90 ELANE (0.37) ELANECA2KMT2A
SCHEMBL15216888 0.88 ELANE (0.43) ELANECA12CA1CA2CA7
SCHEMBL10062506 0.87 ELANE (0.48) ELANECA12CA1CA2CA7
SCHEMBL15045367 0.87 ELANE (0.48) ELANECA12CA1CA2CA7
SCHEMBL15216276 0.84 MAPT (0.38) ELANEALDH1A1MAPT
SCHEMBL15216275 0.81 NPC1 (0.36) CA12CA1CA2CA7CA9
SCHEMBL26059442 0.80 TRPV1 (0.36) ELANECA12CA1CA2CA7
SCHEMBL11991257 0.80 CA1 (0.47) ELANECA1CA2ALDH1A1MAPT
SCHEMBL22694210 0.80 CA12 (0.56) CA12CA1CA2CA7CA9
SCHEMBL12357120 0.79 ELANE (0.45) ELANECA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8957160-B2 Preparation of polymer, resulting polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-17 US disclosed
US-20130224660-A1 PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224659-A1 POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed