SCHEMBL12384147

SCHEMBL12384147

COCCCCOc1nc(OCCCCOC)nc(OCCCCOC)n1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.36
TSHR P16473 1/20 0.34
MAPK1 P28482 3/20 0.33
KCNH3 Q9ULD8 1/20 0.33
POLB P06746 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TLR7 Q9NYK1 3/20 0.32
CYP1A2 P05177 3/20 0.32
PDE4B Q07343 1/20 0.32
PDE4D Q08499 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31
NUDT1 P36639 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25659408 0.83 TSHR (0.41) TSHRMAPK1POLBHSD17B10TLR7
SCHEMBL899058 0.79 NR5A1 (0.43) TSHR
SCHEMBL11009919 0.77 NR5A1 (0.47) TSHR
SCHEMBL11587263 0.77 NR5A1 (0.47) TSHR
SCHEMBL10002246 0.77 TSHR (0.37) TSHRMAPK1POLBHSD17B10TLR7
SCHEMBL598441 0.76 CYP2D6 (0.43) ALDH1A1POLBHSD17B10CYP1A2CYP2D6
SCHEMBL29406803 0.75 TSHR (0.40) TSHRTLR7LMNAHTTNUDT1
SCHEMBL24798573 0.75 RXRA (0.40) POLBHSD17B10MEN1KMT2AHTT
SCHEMBL22576627 0.74 SMN1; SMN2 (0.41) ALDH1A1MAPK1KCNH3HSD17B10MEN1
SCHEMBL12384254 0.74 LOX (0.42) ALDH1A1MAPK1POLBHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8008366-B2 Storage stability, electron beam sensitivity; adhesion strength to organic polymer substrates; acrylic monomers FUJIFILM CORPORATION (JP) 2011-08-30 US disclosed
US-8008366-B2 Storage stability, electron beam sensitivity; adhesion strength to organic polymer substrates; acrylic monomers FUJIFILM CORPORATION (JP) 2011-08-30 US disclosed
US-7906582-B2 Polymerizable composition, tacky material, and adhesive FUJIFILM CORPORATION (JP) 2011-03-15 US disclosed
US-7906582-B2 Polymerizable composition, tacky material, and adhesive FUJIFILM CORPORATION (JP) 2011-03-15 US disclosed
US-20080199691-A1 POLYMERIZABLE COMPOSITION, TACKY MATERIAL, AND ADHESIVE FUJIFILM CORPORATION (JP) 2008-08-21 US disclosed
US-20080199691-A1 POLYMERIZABLE COMPOSITION, TACKY MATERIAL, AND ADHESIVE FUJIFILM CORPORATION (JP) 2008-08-21 US disclosed
US-20080200581-A1 CURABLE COMPOSITION AND PROCESS FOR PRODUCING CURED COATING FUJIFILM CORPORATION (JP) 2008-08-21 US disclosed
US-20080200581-A1 CURABLE COMPOSITION AND PROCESS FOR PRODUCING CURED COATING FUJIFILM CORPORATION (JP) 2008-08-21 US disclosed