⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30519219 | 0.82 | — | — | |
| SCHEMBL3764421 | 0.78 | ALDH1A1 (0.55) | — | |
| SCHEMBL29127445 | 0.75 | ALDH1A1 (0.39) | — | |
| SCHEMBL4821036 | 0.75 | — | — | |
| SCHEMBL12401592 | 0.75 | — | — | |
| SCHEMBL4964921 | 0.71 | — | — | |
| SCHEMBL7649 | 0.71 | — | — | |
| SCHEMBL22981962 | 0.67 | — | — | |
| SCHEMBL1030442 | 0.67 | — | — | |
| Ammonia Solution, Strong SCHEMBL8613097 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116654882-A | Clean and waste-free method for preparing lithium bis (fluorosulfonyl) imide | 浙江大学 | 2023-08-29 | — | — | CN | claimed |
| US-20250101586-A1 | HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC | 2025-03-27 | — | — | US | disclosed |
| EP-4448835-A1 | HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITION OF SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2024-10-23 | — | — | EP | disclosed |
| CN-116654882-A | Clean and waste-free method for preparing lithium bis (fluorosulfonyl) imide | 浙江大学 | 2023-08-29 | — | — | CN | disclosed |
| CN-116654882-A | Clean and waste-free method for preparing lithium bis (fluorosulfonyl) imide | 浙江大学 | 2023-08-29 | — | — | CN | disclosed |
| WO-2023147382-A1 | HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2023-08-03 | — | — | WO | disclosed |
| US-7985347-B2 | Methods of forming a pattern and methods of manufacturing a capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-07-26 | — | — | US | disclosed |
| US-20080142474-A1 | Methods of forming a pattern and methods of manufacturing a capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-06-19 | — | — | US | disclosed |