Quinaldic Acid

Quinaldic Acid

SCHEMBL1242670

O=C(O)c1ccc2ccccc2n1.O=C(O)c1ccc2ccccc2n1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 1.00
CNR2 P34972 4/20 0.69
HDAC8 Q9BY41 1/20 0.63
SMN1; SMN2 Q16637 3/20 0.62
RAB9A P51151 2/20 0.62
NFKB1 P19838 1/20 0.62
NFKB2 Q00653 1/20 0.62
RELA Q04206 1/20 0.62
ALDH1A1 P00352 4/20 0.61
MAPT P10636 2/20 0.61
GAA P10253 1/20 0.61
KDM4C Q9H3R0 1/20 0.59
KMT2A Q03164 4/20 0.58
HPGD P15428 3/20 0.58
MEN1 O00255 3/20 0.58
NPC1 O15118 1/20 0.58
TP53 P04637 1/20 0.58
CYP1A2 P05177 1/20 0.58
CYP2C9 P11712 1/20 0.58
KDM4E B2RXH2 6/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Quinaldic Acid SCHEMBL29350584 1.00 MGAM (1.00) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL39024 1.00 MGAM (1.00) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL4588314 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL2372429 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL5228672 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL8798794 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL4587213 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL13571793 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL5228655 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A
Quinaldic Acid SCHEMBL4802724 0.98 MGAM (0.96) MGAMCNR2HDAC8SMN1; SMN2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110250756-A1 AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING KABUSHIKI KAISHA TOSHIBA (JP) 2011-10-13 US disclosed
US-20110212621-A1 ABRASIVE COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2011-09-01 US disclosed
EP-2352167-A1 ABRASIVE COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Asahi Glass Company Limited (JP) 2011-08-03 EP disclosed
US-20110117821-A1 CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD USING THE SAME, AND METHOD OF RECYCLING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION JSR CORPORATION (JP) 2011-05-19 US disclosed
US-7884020-B2 Polishing cloth and method of manufacturing semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 2011-02-08 US disclosed