SCHEMBL1242682

SCHEMBL1242682

CO[Si](C)(OC)C(N)C(C)CCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9509069 0.80
SCHEMBL535535 0.76 ALDH1A1 (0.36)
SCHEMBL28976024 0.75
SCHEMBL15855988 0.75 GABRR1 (0.31)
SCHEMBL601792 0.74
SCHEMBL303930 0.72
SCHEMBL21590115 0.71
SCHEMBL17026733 0.71 ALDH1A1 (0.32)
SCHEMBL1070708 0.71
Alcohol SCHEMBL28332784 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9707757-B2 Photosensitive negative resin composition CANON KABUSHIKI KAISHA (JP) 2017-07-18 US disclosed
US-9028038-B2 Liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-05-12 US disclosed
US-20150097892-A1 LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2015-04-09 US disclosed
US-20140307022-A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION CANON KABUSHIKI KAISHA (JP) 2014-10-16 US disclosed
US-7879934-B2 Rubber compositions CHEMTURA CORPORATION (US) 2011-02-01 US disclosed
US-20090048376-A1 Rubber compositions ADDIVANT USA, LLC 2009-02-19 US disclosed