Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | MGLL | Q99685 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2754958 | 1.00 | TP53 (0.60) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL1277836 | 0.92 | TP53 (0.61) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL12133586 | 0.91 | TP53 (0.56) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL284818 | 0.88 | TP53 (0.62) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL9347713 | 0.87 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL7656832 | 0.87 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL7860984 | 0.87 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL285188 | 0.87 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL25475695 | 0.86 | TP53 (0.47) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL3222563 | 0.86 | TP53 (0.47) | TP53CYP3A4ALDH1A1MGLLTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160349620-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-8808965-B2 | Pattern forming method, pattern, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20120288691-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-15 | — | — | US | disclosed |
| WO-2011083872-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | WO | disclosed |