SCHEMBL12486012

SCHEMBL12486012

Cl[C](Cl)C(Cl)(Cl)C(Cl)(Cl)C(Cl)(Cl)[C](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12486837 0.91
SCHEMBL12487279 0.87
SCHEMBL18378033 0.87
SCHEMBL12487140 0.87
SCHEMBL12486825 0.87
SCHEMBL12487311 0.87
SCHEMBL392318 0.84
SCHEMBL395093 0.81
SCHEMBL5590764 0.81
SCHEMBL982602 0.80 ALDH1A1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220069354-A1 SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2022-03-03 US disclosed
EP-3904337-A1 SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL FUJIFILM Wako Pure Chemical Corporation (JP) 2021-11-03 EP disclosed
WO-2020138377-A1 SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL 富士フイルム和光純薬株式会社 2020-07-02 WO disclosed
US-10451967-B2 Acid- and radical-generating agent and method for generating acid and radical FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-22 US disclosed
US-20160342084-A1 ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2016-11-24 US disclosed
US-9200093-B2 Polymerization method using surfactant-containing particle SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-12-01 US disclosed
US-20140288251-A1 POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-25 US disclosed
WO-2013085074-A1 POLYMERIZATION METHOD USING SURFACTANT-CONTAINING PARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-06-13 WO disclosed
WO-2013047891-A2 WASHING METHOD, ADDITION POLYMERIZATION METHOD, PREPOLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER USING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-04 WO disclosed
WO-2012118233-A1 ADDITION POLYMERIZATION METHOD, PREPOLYMERIZED CATALYTIC COMPONENT FOR ADDITION POLYMERIZATION, AND METHOD FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-09-07 WO disclosed