⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13089498 | 0.73 | — | — | |
| SCHEMBL13089341 | 0.73 | — | — | |
| SCHEMBL702648 | 0.71 | — | — | |
| SCHEMBL21112850 | 0.69 | — | — | |
| SCHEMBL13089616 | 0.69 | — | — | |
| SCHEMBL3655426 | 0.67 | TSHR (0.32) | — | |
| SCHEMBL704667 | 0.67 | — | — | |
| SCHEMBL21112954 | 0.65 | TSHR (0.30) | — | |
| SCHEMBL21112857 | 0.65 | — | — | |
| SCHEMBL8953551 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1666632-B1 | Porous low dielectric constant compositions and methods for making and using same | AIR PROD & CHEM (US) | 2013-04-24 | — | — | EP | claimed |
| EP-2281920-A1 | Porous low dielectric constant compositions and methods for making and using same | Air Products and Chemicals, Inc. (US) | 2011-02-09 | — | — | EP | claimed |
| US-20080271640-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-11-06 | — | — | US | claimed |
| US-7332445-B2 | Porous low dielectric constant compositions and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-02-19 | — | — | US | claimed |
| EP-1666632-A2 | Porous low dielectric constant compositions and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-06-07 | — | — | EP | claimed |
| US-20060078676-A1 | Porous low dielectric constant compositions and methods for making and using same | VERSUM MATERIALS US, LLC | 2006-04-13 | — | — | US | claimed |
| US-6846515-B2 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-25 | — | — | US | claimed |
| US-20030232137-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-12-18 | — | — | US | claimed |
| US-20030198742-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-10-23 | — | — | US | claimed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | claimed |
| US-8293001-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-23 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20110143032-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-16 | — | — | US | disclosed |
| US-7943195-B2 | Mixing of glass with hydrocarbons; chemical vapor deposition; mixing organosilane and/or organosiloxane precursors with porogens; neohexyl-1,3,5,7-tetramethylcyclo-tetrasiloxane | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| EP-2281920-A1 | Porous low dielectric constant compositions and methods for making and using same | Air Products and Chemicals, Inc. (US) | 2011-02-09 | — | — | EP | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| US-20030232137-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-12-18 | — | — | US | disclosed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | disclosed |
| US-5489634-A | EFFICIENT SELECTIVE CATALYTIC POLYMERIZATION OF ALPHA-OLEFINS YIELDS HIGH MOLECULAR WEIGHT SPHERICAL PARTICLES HAVING HIGH BULK DENSITY, CONTROLLED PARTICLE SIZE AND MOLECULAR WEIGHT DISTRIBUTION | TOSOH CORPORATION (JP) | 1996-02-06 | — | — | US | disclosed |
| EP-0530814-A1 | Method for producing a stereospecific polyolefin | TOSOH CORPORATION (JP) | 1993-03-10 | — | — | EP | disclosed |