⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13089341 | 0.76 | — | — | |
| SCHEMBL13089498 | 0.76 | — | — | |
| SCHEMBL704667 | 0.75 | — | — | |
| SCHEMBL15135088 | 0.75 | TSHR (0.43) | — | |
| SCHEMBL6920596 | 0.73 | TSHR (0.35) | — | |
| SCHEMBL707428 | 0.71 | LMNA (0.30) | — | |
| SCHEMBL13089616 | 0.71 | — | — | |
| SCHEMBL1248703 | 0.71 | — | — | |
| SCHEMBL6830170 | 0.71 | — | — | |
| SCHEMBL17600595 | 0.69 | TP53 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3339311-B1 | VOLATILE MONOAMINO-DIALKOXYSILANES AND THEIR USE FOR CREATING SILICON-CONTAINING FILMS | VERSUM MAT US LLC (US) | 2021-07-21 | — | — | EP | claimed |
| EP-3339311-A1 | VOLATILE MONOAMINO-DIALKOXYSILANES AND THEIR USE FOR CREATING SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2018-06-27 | — | — | EP | claimed |
| EP-2620440-B1 | Volatile monoamino-dialkoxysilanes and their use for creating silicon-containing films | VERSUM MAT US LLC (US) | 2018-04-04 | — | — | EP | claimed |
| US-9677178-B2 | Alkoxyaminosilane compounds and applications thereof | VERSUM MATERIALS US, LLC (US) | 2017-06-13 | — | — | US | claimed |
| US-20160083847-A1 | ALKOXYAMINOSILANE COMPOUNDS AND APPLICATIONS THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-24 | — | — | US | claimed |
| US-9200167-B2 | Alkoxyaminosilane compounds and applications thereof | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-12-01 | — | — | US | claimed |
| US-20130196082-A1 | ALKOXYAMINOSILANE COMPOUNDS AND APPLICATIONS THEREOF | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-08-01 | — | — | US | claimed |
| EP-2620440-A1 | Volatile monoamino-dialkoxysilanes and their use for creating silicon-containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-07-31 | — | — | EP | claimed |
| US-11142658-B2 | Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films | VERSUM MATERIALS US, LLC (US) | 2021-10-12 | — | — | US | disclosed |
| EP-3339311-B1 | VOLATILE MONOAMINO-DIALKOXYSILANES AND THEIR USE FOR CREATING SILICON-CONTAINING FILMS | VERSUM MAT US LLC (US) | 2021-07-21 | — | — | EP | disclosed |
| US-10899500-B2 | Alkoxysilylamine compounds and applications thereof | VERSUM MATERIALS US, LLC (US) | 2021-01-26 | — | — | US | disclosed |
| US-10421766-B2 | Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films | VERSUM MATERIALS US, LLC (US) | 2019-09-24 | — | — | US | disclosed |
| US-20190225377-A1 | Alkoxysilylamine Compounds and Applications Thereof | VERSUM MATERIALS US, LLC (US) | 2019-07-25 | — | — | US | disclosed |
| US-10279959-B2 | Alkoxysilylamine compounds and applications thereof | VERSUM MATERIALS US, LLC (US) | 2019-05-07 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-7005532-B2 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2006-02-28 | — | — | US | disclosed |
| US-20050020845-A1 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1428828-A1 | PROCESS FOR PREPARATION OF ALKOXYSILANES | TOAGOSEI CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |