SCHEMBL1254075

SCHEMBL1254075

C=CC(=O)OOC(=O)c1ccccc1C(=O)OCC

nearest known ligand 0.66

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.66
ALDH1A1 P00352 5/20 0.53
HSD17B10 Q99714 3/20 0.53
CYP3A4 P08684 2/20 0.51
CDC25B P30305 3/20 0.49
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
LMNA P02545 2/20 0.46
CDC25A P30304 1/20 0.46
CDC25C P30307 1/20 0.46
TP53 P04637 1/20 0.45
MAPK1 P28482 1/20 0.45
GSTO1 P78417 1/20 0.44
KDM4E B2RXH2 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29907761 0.88 ALDH1A1 (0.68) TSHRALDH1A1HSD17B10CYP3A4TDP1
SCHEMBL7174922 0.88 ALDH1A1 (0.68) TSHRALDH1A1HSD17B10CYP3A4TDP1
SCHEMBL18783181 0.87 CYP3A4 (0.50) TSHRALDH1A1HSD17B10CYP3A4TDP1
SCHEMBL9492898 0.87 TSHR (0.88) TSHRALDH1A1HSD17B10CYP3A4CDC25B
SCHEMBL644784 0.86 TSHR (0.68) TSHRALDH1A1HSD17B10CYP3A4CDC25B
SCHEMBL30613567 0.86 TSHR (0.68) TSHRALDH1A1HSD17B10CYP3A4CDC25B
SCHEMBL29907700 0.85 TSHR (0.69) TSHRALDH1A1HSD17B10CYP3A4TDP1
SCHEMBL31091399 0.84 TSHR (0.66) TSHRALDH1A1HSD17B10CYP3A4CDC25B
SCHEMBL28053505 0.84 TSHR (0.66) TSHRALDH1A1HSD17B10CYP3A4CDC25B
Diethyl Phthalate SCHEMBL28329107 0.83 TSHR (0.81) TSHRALDH1A1HSD17B10CYP3A4CDC25B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 173 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119552345-A Modified polyurethane resin, semi-cured material, composite material and preparation method thereof 解合元(上海)资源再生科技有限公司 2025-03-04 CN claimed
CN-119552346-A Modified polyurethane resin, modified thermosetting resin and preparation method thereof 解合元(上海)资源再生科技有限公司 2025-03-04 CN claimed
WO-2022186442-A1 PRESSURE-SENSITIVE ADHESIVE COMPOSITION WITH EXCELLENT PIGMENT DISPERSIBILITY, AND PRESSURE-SENSITIVE ADHESIVE SHEET USING SAME 주식회사 켐코 2022-09-09 WO claimed
CN-114173748-A Polymer coating agent having both excellent water-and oil-repellent characteristics and cosmetic composition containing the same having excellent makeup durability 株式会社LG生活健康 2022-03-11 CN claimed
WO-2022050661-A1 ALKALI-SOLUBLE COPOLYMER COMPRISING MALEIMIDE DERIVATIVE AS POLYMERIZATION UNIT, AND PHOTORESIST COMPOSITION INCLUDING SAME 주식회사 삼양사 2022-03-10 WO claimed
US-8399175-B2 Photopolymer resins for photo replication of information layers ADDISON CLEAR WAVE, LLC (US) 2013-03-19 US claimed
CN-101392154-B Anisotropic conductive adhesive composition and anisotropic conductive film comprising the same CHEIL IND INC 2012-06-13 CN claimed
CN-102212165-A Resin for alkali-soluble binder and photosensitive resin composition comprising the same LG CHEMICAL LTD 2011-10-12 CN claimed
US-20090252885-A1 Photopolymer Resins for Photo Replication of Information Layers ADDISON CLEAR WAVE, LLC (US) 2009-10-08 US claimed
CN-101392154-A Anisotropic conductive adhesive composition and anisotropic conductive film comprising the same CHEIL IND INC (KR) 2009-03-25 CN claimed
EP-1992668-A1 Photopolymer resins for photo replication of information layers Addison Clear Wave LLC (US) 2008-11-19 EP claimed
WO-2025104145-A1 AN ETCH RESIST INKJET INK AGFA-GEVAERT NV (BE) 2025-05-22 WO disclosed
EP-4556535-A1 AN ETCH RESIST INKJET INK AGFA-GEVAERT NV (BE) 2025-05-21 EP disclosed
CN-114641710-B Optical article and method for manufacturing optical article 豪雅镜片泰国有限公司 2025-03-07 CN disclosed
CN-119552346-A Modified polyurethane resin, modified thermosetting resin and preparation method thereof 解合元(上海)资源再生科技有限公司 2025-03-04 CN disclosed
CN-1265407-A Pigment dispersion, writing tool and printer storing the same in them thereof DAINICHICEIKA COLOR & CHEMICAL (JP) 2000-09-06 CN disclosed
CN-1262777-A Dispersion composition for black matrix, display, and process for producing display TOSHIBA KK (JP) 2000-08-09 CN disclosed
CN-1260365-A Pigment disperser, pigment dispersing body, writing and recording pigment ink DAINICHICEIKA COLOR & CHEMICAL (JP) 2000-07-19 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed