SCHEMBL125500

SCHEMBL125500

O=C(O)c1ccc[n+](Cc2ccccc2)c1

nearest known ligand 0.73

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.73
L3MBTL1 Q9Y468 1/20 0.73
LMNA P02545 1/20 0.56
CYP2D6 P10635 2/20 0.51
KMT2A Q03164 3/20 0.50
MEN1 O00255 2/20 0.50
ALDH1A1 P00352 1/20 0.50
BCHE P06276 1/20 0.49
ACHE P22303 1/20 0.49
HSP90AA1 P07900 2/20 0.46
DAO P14920 1/20 0.45
TSHR P16473 1/20 0.45
NAPRT Q6XQN6 1/20 0.45
PABPC1 P11940 1/20 0.44
ATM Q13315 1/20 0.44
GLA P06280 1/20 0.42
CYP1A2 P05177 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30057272 1.00 NPSR1 (0.73) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL2805432 0.98 NPSR1 (0.71) NPSR1L3MBTL1LMNACYP2D6KMT2A
Fluoride Ion SCHEMBL5148095 0.98 NPSR1 (0.71) NPSR1L3MBTL1LMNACYP2D6KMT2A
Bromide SCHEMBL5146792 0.98 NPSR1 (0.71) NPSR1L3MBTL1LMNACYP2D6KMT2A
SCHEMBL124203 0.98 NPSR1 (0.71) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL28530287 0.98 NPSR1 (0.71) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL8044881 0.97 NPSR1 (0.69) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL6682577 0.97 NPSR1 (0.69) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL29676296 0.97 NPSR1 (0.69) NPSR1L3MBTL1LMNACYP2D6KMT2A
Hydrochloric Acid SCHEMBL6682576 0.97 NPSR1 (0.69) NPSR1L3MBTL1LMNACYP2D6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250051949-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2025-02-13 US claimed
EP-4457389-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2024-11-06 EP claimed
CN-118451219-A Alkaline composition for copper electroplating comprising a grain refiner 巴斯夫欧洲公司 2024-08-06 CN claimed
WO-2023126257-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2023-07-06 WO claimed
US-20230203694-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2023-06-29 US claimed
EP-3252187-A1 SLIPRING WITH REDUCED CONTACT NOISE Schleifring und Apparatebau GmbH (DE) 2017-12-06 EP claimed
EP-2143820-B1 An electroless gold plating solution ROHM & HAAS ELECT MAT (US) 2012-03-07 EP claimed
EP-2143820-A1 An electroless gold plating solution Rohm and Haas Electronic Materials LLC (US) 2010-01-13 EP claimed
US-7534289-B1 Electroless gold plating solution ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-05-19 US claimed
US-4225497-A ACID CATALYSTS FOR IMIDATION RHONE-POULENC INDUSTRIES (FR) 1980-09-30 US claimed
WO-2026087365-A1 NON-ACIDIC COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2026-04-30 WO disclosed
US-20250051949-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2025-02-13 US disclosed
EP-4457389-A1 ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER BASF SE (DE) 2024-11-06 EP disclosed
CN-118475728-A Alkaline composition for copper electroplating comprising a defect reducing agent 巴斯夫欧洲公司 2024-08-09 CN disclosed
CN-118451219-A Alkaline composition for copper electroplating comprising a grain refiner 巴斯夫欧洲公司 2024-08-06 CN disclosed
US-20070105810-A1 THERAPEUTICS POTTER BARRY V L 2007-05-10 US disclosed
US-20060201820-A1 Aqueous zinc-nickel electroplating alkaline bath, comprising water zinc compound, nickel compound, complexing agent and polyoxyalkylene nonionic surfactant; alloying; smoothness, ductility OPASKAR VINCENT C 2006-09-14 US disclosed
US-20050133376-A1 Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom ATOTECH USA, LLC 2005-06-23 US disclosed
US-6830674-B2 Brightener additive and bath for alkaline cyanide-free zinc electroplating COLUMBIA CHEMICAL CORPORATION 2004-12-14 US disclosed
US-4225497-A ACID CATALYSTS FOR IMIDATION RHONE-POULENC INDUSTRIES (FR) 1980-09-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070105810-A1 THERAPEUTICS RYR1, ATP2A1, CACNA1E NPSR1 322/4885L3MBTL1 3603/4885LMNA 4580/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.