SCHEMBL12550856

SCHEMBL12550856

O=C(OCCN1CCS(=O)(=O)CC1)c1ccc2c(c1)OCO2

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.65
▸ ALDH1A1 P00352 2/20 0.51
▸ MAOB P27338 2/20 0.51
▸ HPGD P15428 1/20 0.51
▸ NPC1 O15118 2/20 0.50
▸ RAB9A P51151 2/20 0.50
▸ LMNA P02545 2/20 0.50
▸ HRH3 Q9Y5N1 1/20 0.49
▸ KDM4E B2RXH2 2/20 0.48
▸ MEN1 O00255 1/20 0.48
▸ KMT2A Q03164 1/20 0.48
▸ ULK1 O75385 1/20 0.48
▸ HSD17B10 Q99714 1/20 0.47
▸ ADRB2 P07550 1/20 0.47
▸ ADRB1 P08588 1/20 0.47
▸ ADRB3 P13945 1/20 0.47
▸ PKM P14618 1/20 0.47
▸ ATM Q13315 1/20 0.47
▸ L3MBTL1 Q9Y468 1/20 0.47
▸ DRD2 P14416 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12550802 0.90 SMN1; SMN2 (0.79) SMN1; SMN2ALDH1A1HPGDNPC1RAB9A
SCHEMBL12550805 0.90 SMN1; SMN2 (0.79) SMN1; SMN2ALDH1A1HPGDNPC1RAB9A
SCHEMBL21705703 0.78 KMT2A (0.55) SMN1; SMN2ALDH1A1HPGDHRH3KDM4E
SCHEMBL12550691 0.78 HRH3 (0.56) SMN1; SMN2ALDH1A1LMNAHRH3MEN1
SCHEMBL12550692 0.78 HRH3 (0.79) SMN1; SMN2HPGDHRH3KDM4EMEN1
SCHEMBL12550746 0.77 HRH3 (0.53) SMN1; SMN2ALDH1A1HRH3KDM4EMEN1
SCHEMBL14369826 0.76 ADRB2 (0.55) SMN1; SMN2ALDH1A1NPC1RAB9ALMNA
SCHEMBL12550775 0.76 HRH3 (0.55) SMN1; SMN2HRH3KDM4EMEN1KMT2A
SCHEMBL12550759 0.76 HRH3 (0.55) SMN1; SMN2HRH3KDM4EMEN1KMT2A
SCHEMBL12550792 0.75 KMT2A (0.51) SMN1; SMN2ALDH1A1HPGDHRH3KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828641-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-09 — — US disclosed
US-8828641-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-09 — — US disclosed
US-20110129777-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-06-02 — — US disclosed
US-20110129777-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-06-02 — — US disclosed
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