SCHEMBL125563

SCHEMBL125563

CC(C)(C)CCCCCC(=O)OOOC(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.32
LMNA P02545 3/20 0.31
TDP1 Q9NUW8 2/20 0.31
FFAR1 O14842 1/20 0.31
CPT2 P23786 1/20 0.31
TSHR P16473 2/20 0.30
ALDH1A1 P00352 2/20 0.30
PAM P19021 2/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29525594 0.98 TSHR (0.31) TDP1TSHRALDH1A1HSD17B10
SCHEMBL28623285 0.93 TSHR (0.32) TDP1TSHRALDH1A1HSD17B10
SCHEMBL5494897 0.92
SCHEMBL491916 0.91 DGKA (0.38) DGKALMNATDP1TSHRALDH1A1
SCHEMBL679714 0.91 DGKA (0.38) DGKALMNATDP1TSHRALDH1A1
SCHEMBL4105663 0.89 DGKA (0.34) DGKALMNATDP1FFAR1CPT2
SCHEMBL35530 0.89 DGKA (0.34) DGKALMNATDP1FFAR1CPT2
SCHEMBL1845580 0.89 TSHR (0.37) DGKALMNATDP1TSHRALDH1A1
SCHEMBL29084299 0.87 TSHR (0.33) DGKATDP1TSHRALDH1A1HSD17B10
SCHEMBL29022969 0.86 DGKA (0.32) DGKALMNATDP1FFAR1CPT2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1376 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11834539-B2 Photocurable material composition, cured product of photocurable material composition and manufacturing method thereof CANON KABUSHIKI KAISHA (JP) 2023-12-05 US claimed
WO-2022117389-A1 METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER BASF SE (DE) 2022-06-09 WO claimed
EP-3715387-B1 VINYL CHLORIDE-BASED POLYMER AND PREPARATION METHOD THEREOF LG CHEMICAL LTD (KR) 2022-01-05 EP claimed
CN-105717747-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN claimed
CN-105717743-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN claimed
US-11186658-B2 Vinyl chloride-based polymer and preparation method thereof LG CHEM, LTD. (KR) 2021-11-30 US claimed
US-20200362066-A1 VINYL CHLORIDE-BASED POLYMER AND PREPARATION METHOD THEREOF LG CHEM, LTD. (KR) 2020-11-19 US claimed
EP-3715387-A1 VINYL CHLORIDE-BASED POLYMER AND METHOD FOR PRODUCING SAME LG CHEM, LTD. (KR) 2020-09-30 EP claimed
WO-2020060028-A1 VINYL CHLORIDE-BASED POLYMER AND METHOD FOR PRODUCING SAME 주식회사 엘지화학 2020-03-26 WO claimed
EP-3075750-B1 METHOD FOR PREPARING VINYL CHLORIDE-BASED RESIN HANWHA CHEMICAL CORP (KR) 2020-01-08 EP claimed
EP-0384431-B1 Process for making a propylene polymer with free-end long chain branching and use thereof HIMONT INC (US) 1994-11-30 EP claimed
US-5362828-A One of which does not have benzene ring or alkoxy group; emulsion polymerization SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-11-08 US claimed
EP-0299025-B1 IMPROVED HAIR TREATING RESINS ISP INVESTMENTS INC. (US) 1993-05-19 EP claimed
US-5047485-A Process for making a propylene polymer with free-end long chain branching and use thereof HIMONT INCORPORATED (US) 1991-09-10 US claimed
EP-0384431-A2 Process for making a propylene polymer with free-end long chain branching and use thereof Himont Incorporated (US) 1990-08-29 EP claimed
EP-0299025-A4 IMPROVED HAIR TREATING RESINS. GAF CORP (US) 1989-05-30 EP claimed
EP-0299025-A1 IMPROVED HAIR TREATING RESINS. GAF CORP (US) 1989-01-18 EP claimed
WO-1988005442-A1 IMPROVED HAIR TREATING RESINS GAF CORPORATION (US) 1988-07-28 WO claimed
US-4689379-A TERPOLYMER OF VINYL ESTER, ALKYL MALEATE HALF ESTER AND ACRYLATE OR METHACRYLATE ESTER GAF CORPORATION (US) 1987-08-25 US claimed
US-4377498-A Aqueous peroxide emulsion for use with glass fibers PPG INDUSTRIES, INC. (US) 1983-03-22 US claimed