⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12569447 | 0.86 | CA2 (0.35) | — | |
| SCHEMBL178357 | 0.85 | CA1 (0.30) | — | |
| SCHEMBL18744491 | 0.85 | CA1 (0.30) | — | |
| SCHEMBL22248493 | 0.76 | CA1 (0.35) | — | |
| SCHEMBL11897583 | 0.74 | CA1 (0.33) | — | |
| SCHEMBL2304270 | 0.72 | — | — | |
| SCHEMBL13391567 | 0.72 | — | — | |
| SCHEMBL19989291 | 0.71 | TP53 (0.30) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL30705206 | 0.70 | TP53 (0.33) | — | |
| SCHEMBL25949594 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110136062-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-06-09 | — | — | US | disclosed |
| US-20090325102-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2009-12-31 | — | — | US | disclosed |
| US-20080292989-A1 | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-11-27 | — | — | US | disclosed |