SCHEMBL125904

SCHEMBL125904

CCc1nc(N)nc(N)n1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CASP1 P29466 1/20 0.52
HRH4 Q9H3N8 2/20 0.50
CYP1A2 P05177 2/20 0.44
LMNA P02545 4/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
HTT P42858 1/20 0.38
HSD17B10 Q99714 1/20 0.38
NPC1 O15118 3/20 0.37
RAB9A P51151 3/20 0.37
TSHR P16473 1/20 0.35
HSP90AA1 P07900 1/20 0.34
HEXA P06865 4/20 0.33
HEXB P07686 4/20 0.33
DHFR P00374 2/20 0.33
MEN1 O00255 1/20 0.31
SLC22A1 O15245 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31
HTR1A P08908 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL28241223 0.94 CASP1 (0.48) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL2623099 0.94 HRH4 (0.50) CASP1HRH4CYP1A2LMNASMN1; SMN2
Ammonia Solution, Strong SCHEMBL27881505 0.91 HRH4 (0.48) CASP1HRH4CYP1A2LMNASMN1; SMN2
Acetic Acid SCHEMBL1938187 0.85 CYP1A2 (0.56) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL3688228 0.84 HSP90AA1 (0.48) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL10724916 0.83 HRH4 (0.41) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL15171177 0.82 HRH4 (0.43) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL8220440 0.82 HRH4 (0.43) CASP1HRH4CYP1A2LMNASMN1; SMN2
Aniline SCHEMBL28092434 0.82 NPC1 (0.48) CASP1HRH4CYP1A2LMNASMN1; SMN2
SCHEMBL10876748 0.78 HRH4 (0.41) CASP1HRH4CYP1A2LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 408 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2427522-B1 AN AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES BASF SE (DE) 2017-03-01 EP claimed
US-8747687-B2 Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces BASF SE (DE) 2014-06-10 US claimed
EP-2427522-A1 AN AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES BASF SE (DE) 2012-03-14 EP claimed
US-20120058641-A1 AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES BASF SE (DE) 2012-03-08 US claimed
WO-2010127938-A1 AN AQUEOUS POLISHING AGENT COMPRISING SOLID POLYMER PARTICLES AND TWO COMPLEXING AGENTS AND ITS USE IN A PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES BASF SE (DE) 2010-11-11 WO claimed
EP-1998616-A1 NEW SYNERGISTIC HERBICIDAL COMPOSITIONS Isagro Ricerca S.r.l. (IT) 2008-12-10 EP claimed
WO-2007101587-A1 NEW SYNERGISTIC HERBICIDAL COMPOSITIONS ISAGRO RICERCA S.R.L. (IT) 2007-09-13 WO claimed
US-5700389-A COMPRISING SULFURIC ACID, PERSULFATE, IMIDAZOLE, PYRIDINE OR TRIAZINE DERIVATIVE, WATER, AMIDOSULFURIC ACID OR ALIPHATIC SULFONIC ACID MEC CO., LTD. (JP) 1997-12-23 US claimed
EP-0397582-B1 Imide groups containing polymers made from hindered diamines CIBA GEIGY AG (CH) 1994-12-14 EP claimed
US-5122590-A Addition-condensation copolymer comprising an N,N*-bismaleimide, hindered aromatic diprimary diamine, a diamino-s-triazine, a halogenated epoxy resin and a diallyl oxylated benzene; heat resistance; prepregs RHONE-POULENC CHIMIE (FR) 1992-06-16 US claimed
US-5100767-A Epoxy resins TAMURA KAKEN CO., LTD. (JP) 1992-03-31 US claimed
US-4593069-A Containing 2-vinyl-4,6-diamino-s-triazine or adduct thereof with isocyanuric acid SHIKOKU CHEMICALS CORP. (JP) 1986-06-03 US claimed
EP-0166588-A1 Epoxy resin composition SHIKOKU CHEMICALS CORPORATION (JP) 1986-01-02 EP claimed
JP-61068475-A None JP disclosed
JP-5160172-A None JP disclosed
JP-5129347-A None JP disclosed
EP-0003799-B1 FINELY DIVIDED EXPANDABLE STYRENE POLYMERS AND PROCESS FOR THEIR PREPARATION HOECHST AKTIENGESELLSCHAFT (DE) 1981-11-04 EP disclosed
US-4211688-A Process for dyeing high-molecular organic material in the melt CIBA-GEIGY CORPORATION (US) 1980-07-08 US disclosed
US-4192922-A Finely divided expandable styrene polymers HOECHST AKTIENGESELLSCHAFT (DE) 1980-03-11 US disclosed
US-4168364-A Cyanamides of organic primary amines as epoxy curing agents CIBA-GEIGY CORPORATION (US) 1979-09-18 US disclosed