SCHEMBL12604145

SCHEMBL12604145

CC(Cc1ccc(O)cc1)C(C)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.53
ESR2 Q92731 4/20 0.53
TAAR1 Q96RJ0 3/20 0.50
MME P08473 1/20 0.50
SLC6A2 P23975 1/20 0.50
TRPA1 O75762 2/20 0.48
SIGMAR1 Q99720 1/20 0.46
CYP2D6 P10635 1/20 0.46
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
MMP9 P14780 1/20 0.45
MMP8 P22894 1/20 0.45
OPRM1 P35372 3/20 0.44
OPRK1 P41145 2/20 0.44
OPRD1 P41143 1/20 0.44
TRPV1 Q8NER1 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6546282 0.86 CYP2D6 (0.59) TAAR1MMESLC6A2TRPA1SIGMAR1
SCHEMBL6547617 0.83 SMN1; SMN2 (0.50) TAAR1SLC6A2TRPA1SIGMAR1CYP2D6
SCHEMBL4602654 0.81 ESR1 (0.81) ESR1ESR2TAAR1SLC6A2TRPA1
SCHEMBL1936402 0.81 ESR1 (0.81) ESR1ESR2TAAR1SLC6A2TRPA1
SCHEMBL20906818 0.81 SLC6A2 (0.49) SLC6A2TRPA1OPRM1OPRK1OPRD1
SCHEMBL20673669 0.80 TAAR1 (0.67) ESR1ESR2TAAR1SLC6A2TRPA1
SCHEMBL20673668 0.80 TAAR1 (0.67) ESR1ESR2TAAR1SLC6A2TRPA1
Ammonia Solution, Strong SCHEMBL8866157 0.79 ESR1 (0.78) ESR1ESR2TAAR1MMESLC6A2
SCHEMBL12604223 0.79 MEN1 (0.56) SIGMAR1CYP2D6MEN1KMT2A
SCHEMBL8714224 0.78 TAAR1 (0.51) ESR1ESR2TAAR1SLC6A2TRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8372938-B2 Mask material composition, method of forming impurity diffusion layer, and solar battery TOKYO OHKA KOGYO CO., LTD. (JP) 2013-02-12 US disclosed
US-20110108095-A1 MASK MATERIAL COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-12 US disclosed