Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TSHR | P16473 | 5/20 | 0.33 |
| ▸ | NOS3 | P29474 | 2/20 | 0.33 |
| ▸ | NOS1 | P29475 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL11224895 | 1.00 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| SCHEMBL2058662 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1CA1CA2 | |
| Fluoride Ion SCHEMBL10907293 | 0.96 | ALDH1A1 (0.39) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Fluoride Ion SCHEMBL10437963 | 0.96 | ALDH1A1 (0.39) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Fluoride Ion SCHEMBL126102 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Fluoride Ion SCHEMBL11224900 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Hydrochloric Acid SCHEMBL7520467 | 0.93 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1CA1CA2 | |
| Fluoride Ion SCHEMBL11224891 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Fluoride SCHEMBL10437961 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 | |
| Fluoride Ion SCHEMBL126104 | 0.93 | ALDH1A1 (0.37) | ALDH1A1TSHRNOS3NOS1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 139 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-1987005540-A1 | SHRINKAGE-RESISTANT ULTRAVIOLET-CURING COATINGS | DESOTO, INC. (US) | 1987-09-24 | — | — | WO | claimed |
| US-4657779-A | MIXTURES OF EPOXIES AND HYDROXY-CONTAINING ACRYLATES WITH A PHOTOSENSITIVE DIFUNCTIONAL CATALYST | DESOTO, INC. (US) | 1987-04-14 | — | — | US | claimed |
| WO-2024122416-A1 | METHOD FOR PRODUCING LAMINATED BODY WITH HARD COAT LAYER | 東亞合成株式会社 | 2024-06-13 | — | — | WO | disclosed |
| US-20240158904-A1 | UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF | TOAGOSEI CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| US-11971659-B2 | Photoresist composition and method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| US-11966162-B2 | Photoresist composition and method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-23 | — | — | US | disclosed |
| US-20240126170-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-18 | — | — | US | disclosed |
| US-11934101-B2 | Photoresist composition and method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-19 | — | — | US | disclosed |
| US-20240087890-A1 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-14 | — | — | US | disclosed |
| CN-117420728-A | Method for manufacturing semiconductor device and photoresist composition | 台湾积体电路制造股份有限公司 | 2024-01-19 | — | — | CN | disclosed |
| US-20230408918-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-21 | — | — | US | disclosed |
| EP-1026211-A1 | COATING COMPOSITION AND METHOD FOR APPLYING THE SAME | KANSAI PAINT CO., LTD. (JP) | 2000-08-09 | — | — | EP | disclosed |
| EP-0687697-B1 | A carbonate group-modified epoxy resin and thermosetting compositions of resins containing hydroxyalkyl carbonate groups | DAICEL CHEM (JP) | 2000-05-03 | — | — | EP | disclosed |
| US-5733982-A | CURABLE COMPOSITIONS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1998-03-31 | — | — | US | disclosed |
| US-5556927-A | FILMS, COATINGS, REACTION OF EPOXY RESIN OR LACTONE MODIFIED EPOXY RESIN WITH CYCLIC CARBONATE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0687697-A2 | A carbonate group-modified epoxy resin and thermosetting compositions of resins containing hydroxyalkyl carbonate groups | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1995-12-20 | — | — | EP | disclosed |
| US-5393642-A | Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions | THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) | 1995-02-28 | — | — | US | disclosed |
| US-5248734-A | Aromatization of a substituted polycyclohexadiene polymer | CORNELL RESEARCH FOUNDATION, INC. (US) | 1993-09-28 | — | — | US | disclosed |
| WO-1987005540-A1 | SHRINKAGE-RESISTANT ULTRAVIOLET-CURING COATINGS | DESOTO, INC. (US) | 1987-09-24 | — | — | WO | disclosed |
| US-4657779-A | MIXTURES OF EPOXIES AND HYDROXY-CONTAINING ACRYLATES WITH A PHOTOSENSITIVE DIFUNCTIONAL CATALYST | DESOTO, INC. (US) | 1987-04-14 | — | — | US | disclosed |